2005
DOI: 10.1002/ange.200462995
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Uniform, Axial‐Orientation Alignment of One‐Dimensional Single‐Crystal Silicon Nanostructure Arrays

Abstract: Feine Kratzer auf der Oberfläche: Eine einfache Ätztechnik, die von einem Ag‐Nanopartikelnetzwerk unterstützt wird und großflächige 1D‐Anordnungen von Siliciumnanostrukturen mit der gewünschten Orientierung und Dotierungscharakteristik liefert, wird vorgestellt (siehe Bild). Aus den experimentellen Befunden wird ein Mechanismus für das hoch selektive Ätzen abgeleitet.

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Cited by 86 publications
(86 citation statements)
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References 30 publications
(27 reference statements)
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“…However, more recently, contradictory reports have shown the formation of slanted NWs from substrates with these orientations [59,80,[118][119][120]. Furthermore, non-(100) substrates have shown preferential etching in the (100) direction [59,80,[118][119][120]. It was found that for (100) wafers with resistivities of 6-8 Ω·cm, vertical (100) Si NWs were formed at a volumetric ratio of 3:1 HF:H 2 O 2 , while (111) Si NWs were generated when the HF concentration was increased [91].…”
Section: Orientation Control Of Si Nws Using Mac Etchingmentioning
confidence: 98%
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“…However, more recently, contradictory reports have shown the formation of slanted NWs from substrates with these orientations [59,80,[118][119][120]. Furthermore, non-(100) substrates have shown preferential etching in the (100) direction [59,80,[118][119][120]. It was found that for (100) wafers with resistivities of 6-8 Ω·cm, vertical (100) Si NWs were formed at a volumetric ratio of 3:1 HF:H 2 O 2 , while (111) Si NWs were generated when the HF concentration was increased [91].…”
Section: Orientation Control Of Si Nws Using Mac Etchingmentioning
confidence: 98%
“…The etching mechanism proposed by Peng et al [60] begins with the electroless deposition of Ag particles on the Si substrate. This occurs via two simultaneous electrochemical processes on the Si surface.…”
Section: Mac Etching Processmentioning
confidence: 99%
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“…In recent years, a simple Ag catalytic etching technique has been used to prepare large-area, aligned SiNW arrays on single-crystal silicon wafers [29][30][31][32]. The location, size, length and orientation control of silicon nanowire arrays have been established by catalytic etching through a pre-patterned template.…”
Section: Introductionmentioning
confidence: 99%
“…[16] Unlike other as-grown SiNWs with unknown impurities and properties, our as-etched SiNWs inherited well-defined properties from mother silicon wafers, so that they would serve as a model material for the study of surface effects. The typical diameter of the as-etched SiNWs was around 100 nm and well above the quantum size region.…”
mentioning
confidence: 99%