This paper describes polidimethylsiloxane(PDMS) based bonding for assembly of microstructure device, an UV lithography applications for fabricating a 3-dimensional (3D) feed-horn-shaped structure mold array, and obtaining parallel light by using a mirror-reflected parallel-beam illuminator (MRPBI) system. A 3D feedhorn-shaped micro-electro-mechanical systems (MEMS) antenna has some attractive features for array applications, which can be used to improve microbolometer performance and to enhance the optical efficiency for thin film transistor-liquid crystal display (TFT-LCD) and other display devices but currently, MEMS technology has faced many difficulties in the fabrication of a 3D feed-hornshaped MEMS antenna array itself. The purpose of this paper is to propose a new fabrication method to realize a 3D feed-horn-shaped MEMS antenna array by using a mirror-reflected parallel-beam illuminator (MRPBI) System with a very slowly rotated, inclined x-y-z stage. With a conventional UV lithography apparatus, it is very difficult to fabricate high-aspect-ratio structures (HARS) because a typical UV lithography apparatus cannot produce perfectly parallel light. From a theoretical analysis, a columnar illuminator over 6 m in height is required to achieve parallel light, but generally a laboratory height is not 6 m. Also, a novel method of lithography was tried to make a 3D structure array by exposing a planar wafer to the generated parallel light and rotating an inclined x-y-z stage at an ultra-slow rate. An optimization of the 3D structure array can be achieved by simulating a 3D feed-horn MEMS antenna. The feasibility of fabricating both a 3D feed horn MEMS antenna and assembly of detector with 3D feed-horn MEMS antenna was demonstrated. As a result, it seems possible to use a 3D feed-horn-shaped MEMS antenna to improve microbolometer performance and to fabricate several optical microstructure applications.
IntroductionModern advances in the micro-electro-mechanical systems (MEMS) technologies have given rise to the advent of various MEMS fabrication techniques for fabricating microstructures from various materials [1-3]. There is also a need for complicated 3-dimensional microstructures with high aspect ratios for such applications as enhanced microbolometer-coupled 3D MEMS antenna arrays and enhanced optical efficiency and other optical devices [4][5]. Figure 1 shows a schematic drawing of a 3D feed-horn MEMS antenna coupled with a microbolometer. Although the 3D feed-horn MEMS antenna structures have many advantages, it is difficult to fabricate them using conventional UV lithography techniques. In this paper, a novel method for realizing 3D feed-horn MEMS antenna assembled infrared detector.
Novel UV-photolithography apparatusThe most difficult problem in the fabrication of high-aspect-ratio structures (HARS) and 3D feed-horn-shaped MEMS antenna arrays is how to achieve a parallel beam when using a UV lithography apparatus. UV light propagation longer than 6 m would be required for a 11.16 cm 2 exposure area. Accord...