Ultraviolet/vacuum-ultraviolet emission from a high power magnetron sputtering plasma with an aluminum target

Abstract

We report the in situ measurement of the ultraviolet/vacuum-ultraviolet (UV/VUV) emission from a plasma produced by high power impulse magnetron sputtering with aluminum target, using argon as background gas. The UV/VUV detection system is based upon the quantification of the re-emitted fluorescence from a sodium salicylate layer placed in a housing inside the vacuum chamber at 11 cm from the center of the cathode. The detector is equipped with filters that allow for differentiating various spectral regions, and with a front collimating tube that provides a spatial resolution ≈ 0.5 cm. Using various views of the plasma, the measured absolutely calibrated photon rates enable to calculate emissivities and irradiances based on a model of the ionization region. We present results that demonstrate that Al + ions are responsible for most of the VUV irradiance. We also discuss the photoelectric emission due to irradiances on the target~ 2 × 10 s • cm produced by high energy photons from resonance lines of Ar + .

Holistic Approach toward a Damage-Less Sputtered Indium Tin Oxide Barrier Layer for High-Stability Inverted Perovskite Solar Cells and Modules

“…To contribute to a better understanding of this, the emission spectrum of the sputter was measured through the window of the sputtering chamber (see Figure S3). The spectrum reveals that the peaks at the wavelength (λ) 325 nm correspond to UV, while the peaks at 450 and 600 nm may correspond to the plasma. , To decouple the bombardment damage from UV/plasma damage, we performed an experiment in which the ITO/PTAA/3C-IL/PC 61 BM/BCP device was masked with a glass microscope slide and subjected to UV/plasma (see Figure a). This enables only UV/plasma treatment of the device, rather than the harsh bombardment of plasma particles.…”

Review on vacuum ultraviolet generation in low‐pressure plasmas

“…The publication by Iglesias et al [ 34 ] stands out from others because the electron density was much higher (around two orders of magnitude) than in other publications. HiPIMS is typically used for the deposition of thin films on substrates with complex geometry.…”

“…The authors also noted that for polystyrene, the VUV absorption coefficient was sufficiently low, so the VUV photons traveled much deeper through the layers compared with the ions that deposit energy only through the first nanometers or so. Iglesias et al [34] 1300-24,000…”

“…In both cases, the discharge current was 2 A. The authors extrapolated values of VUV flux for similar conditions from the data in the recent publication by Iglesias et al, [ 34 ] where high‐power impulse magnetron sputtering (HiPIMS) argon plasma over an aluminum cathode was used, and mostly ionic radiation arrived at the detector. They found the values consistent.…”

“…Pal et al [33] X Iglesias et al [34] X Es-sebbar et al [35] X X Iglesias et al [36] X X Proshina et al [37] X Fantz et al [38] X X X Tigrine et al [39] X X Zotovich et al [40] X X Es-sebbar et al [41] Relative intensities X Rakhimova et al [42] X Boffard et al [43] X X X Zaima et al [44] Lee et al [45] Relative intensities X X Pargon et al [46] X Jinnai et al [47] X X Titus et al [48] X X X X Woodworth et al [49] X Barton et al [50] X X Abbreviation: VUV, vacuum ultraviolet.…”