2021
DOI: 10.1002/ppap.202100061
|View full text |Cite
|
Sign up to set email alerts
|

Review on vacuum ultraviolet generation in low‐pressure plasmas

Abstract: Low‐pressure nonequilibrium plasmas can be a source of intense radiation in the vacuum ultraviolet (VUV) range which can play an important role in the surface modification of solid materials. Herein, we review the available literature on VUV radiation from low‐pressure gaseous plasmas sustained by inductively and capacitively coupled radiofrequency discharges, microwave, and magnetized discharges. The reported VUV fluxes range from about 1014–1017 photons cm−2·s−1 while electron density range from 109 to 1012 … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
13
0

Year Published

2021
2021
2025
2025

Publication Types

Select...
10

Relationship

3
7

Authors

Journals

citations
Cited by 20 publications
(14 citation statements)
references
References 58 publications
0
13
0
Order By: Relevance
“…A high dissociation fraction of oxygen molecules persists even in late afterglows, where other reactants are absent. Oxygen plasma is also a source of VUV radiation at about 130.4 nm arising from the resonant transition of O atoms [ 27 ], although the radiation is not as extensive as that from argon plasma at identical conditions [ 28 ]. The two necessary requirements for surface activation are therefore satisfied when using oxygen plasma: VUV radiation for breaking C–F bonds or the polymer chain and O atoms for the occupation of the dangling bonds.…”
Section: Modification Of Pvdf Surface By Exposure To Oxygen Plasmamentioning
confidence: 99%
“…A high dissociation fraction of oxygen molecules persists even in late afterglows, where other reactants are absent. Oxygen plasma is also a source of VUV radiation at about 130.4 nm arising from the resonant transition of O atoms [ 27 ], although the radiation is not as extensive as that from argon plasma at identical conditions [ 28 ]. The two necessary requirements for surface activation are therefore satisfied when using oxygen plasma: VUV radiation for breaking C–F bonds or the polymer chain and O atoms for the occupation of the dangling bonds.…”
Section: Modification Of Pvdf Surface By Exposure To Oxygen Plasmamentioning
confidence: 99%
“…As mentioned [30,31], characteristic values of energy are approximately up to 10 10 -10 11 photon/s per single pulse for synchrotron radiation. Our fluxes are higher than other low-pressure plasma emitters allow (up to 10 17 photon/s for a single pulse) [32]. Besides, synchrotron radiation is strongly directed and creates mainly local high-temperature fields and stress gradients when irradiating.…”
Section: Introductionmentioning
confidence: 81%
“…Another scientific challenge is the determination of the role played by the photon energy. The low-pressure plasma is a suitable source of such radiation, and plasmas sustained in different gases will provide VUV radiation peaking at different wavelengths [51]. The synergies between the VUV photons and reactive oxygen species (particularly neutral oxygen atoms) also represent a scientific challenge not tackled yet in the case of PET samples.…”
Section: Conclusion and Roadmapmentioning
confidence: 99%