2001
DOI: 10.1016/s0040-6090(00)01595-9
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Ultrathin μc-Si films deposited by PECVD

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Cited by 13 publications
(6 citation statements)
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“…Conversely, amorphous silicon shows a single wide maximum in this part of the spectrum. The two R peaks can be used to identify and quantify the crystalline silicon phase in microcrystalline silicon films [12]. After 1250 °C annealing MS and PECVD samples indeed show two R peak that are not present al lower annealing temperature.…”
Section: Uv-reflectancementioning
confidence: 98%
“…Conversely, amorphous silicon shows a single wide maximum in this part of the spectrum. The two R peaks can be used to identify and quantify the crystalline silicon phase in microcrystalline silicon films [12]. After 1250 °C annealing MS and PECVD samples indeed show two R peak that are not present al lower annealing temperature.…”
Section: Uv-reflectancementioning
confidence: 98%
“…In the fourth column, only the signal intensities at 480 cm Ϫ1 and 520 cm Ϫ1 are taken for the amorphous and the crystalline fraction respectively; a method used, for example, in Ref. 6. In the following column, the result from fitting three Gaussian line profiles is shown ͑fitting procedure is copied from Ref.…”
Section: Comparison With Other Techniquesmentioning
confidence: 99%
“…The ratio y varies with the excitation wavelength and with the grain size [5] and a value of 0.8 was adopted [4]. Second, even more simple method used in our laboratory and for example in [6,7], is the crystallinity determination from the amplitudes of crystalline and amorphous bands. The crystallinity is calculated as…”
Section: Introductionmentioning
confidence: 99%