“…From one point of view, such a high threshold can result in high microwave power generation; from another point of view, it leads to a high dissipated power in the active region of the device. The generation current limitation is one of the most critical problems for the GaAs and InP TED design [10]. To overcome the limitation, different approaches have been taken, including the use of low-doped regions near the cathode contact (notching), planar doped barriers, camel diodes, heterojunction lounchers, and tunnel injection [10][11][12][13][14].…”