Tunable Plasmonic Resonances in TiN Nanorod Arrays

Jen, Yi‐Jun; Chan, Teh-Li; Liao, Bo-Huei; Li, Zheng-Xing; Liu, Wei-Chen; Cong, Ming-Yang

doi:10.3390/coatings9120863

Cited by 5 publications

(8 citation statements)

References 25 publications

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“…The thickness of the bideposited film was controlled accordingly. The optical property of a TiN NRA was reported in our previous paper [23]. The TiN NRA in this work was used to discover the growth rate of GLAD.…”

Section: Fabricationmentioning

confidence: 83%

“…The difference between k x and k y increased with the wavelength in Figure 5, which was in agreement with the fact that the difference between the s-polarized extinctance and p-polarized extinctance remained similar over the wavelength range in Figure 4. A typical deposited TiN film exhibited metal properties at infrared wavelengths and the magnitude of its negative real permittivity increased with wavelength [23]. Therefore the anisotropic structure caused anisotropic extinction, which increased with the wavelength.…”

Section: Measurement and Discussionmentioning

confidence: 99%

“…All the films were deposited with a substrate bias of 100 V and the flow rates of Ar and N 2 were fixed at 15 and 3.5 sccm, respectively. The deposition parameters were demonstrated to result in the growth of a metal-like TiN thin film [23]. To determine the actual growth deposition rate of bideposition, a slanted TiN nanorod array (NRA) with a thickness of 90.4 nm was fabricated by GLAD before bideposition.…”

Section: Fabricationmentioning

confidence: 99%

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Obliquely Bideposited TiN Thin Film with Morphology-Dependent Optical Properties

Jen

Lin

2021

Coatings

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TiN thin films were obliquely bideposited with different subdeposit thicknesses. The morphology of the bideposited film was varied from a nano-zigzag array to a vertically grown columnar structure by reducing the subdeposit thickness. The principal index of refraction and extinction coefficient were obtained to explain the measured reflectance and transmittance spectra. The loss of the bideposited thin film decreased as the thickness of the subdeposit decreased. The principal indices for normal incidence were near or under unity, indicating the low reflection by the bideposited thin films. A TiN film with a subdeposit thickness of 3 nm demonstrated an average index of refraction of 0.83 and extinction coefficient of below 0.2 for visible wavelengths. The retrieved principal refractive indexes explained the anisotropic transmission and reflection. For most normal incident cases, the analysis offers the tunable anisotropic property of a TiN nanostructured film for multilayer design in the future.

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Section: Fabricationmentioning

confidence: 83%

Section: Measurement and Discussionmentioning

confidence: 99%

Section: Fabricationmentioning

confidence: 99%

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Obliquely Bideposited TiN Thin Film with Morphology-Dependent Optical Properties

Jen

Lin

2021

Coatings

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“…By setting the incoming particle flux at highly oblique angles with respect to the normal of the substrate, the growth mechanism is mainly governed by shadowing effects. Although numerous works have been dedicated to understand the columnar growth and texture development in off-normally deposited films [22][23][24][25], fundamental studies on TMN films deposited at GLAD conditions are relatively scarce [26,27], although promising properties have been recently achieved [13,14,28,29]. In particular, TiN films were found to exhibit a biaxial texture [30], in which the growing crystallites possess both a specific out-of-plane and in-plane preferred orientations.…”

Section: Introductionmentioning

confidence: 99%

Study of columnar growth, texture development and wettability of reactively sputter-deposited TiN, ZrN and HfN thin films at glancing angle incidence

Mareus

Mastail

Anğay

et al. 2020

Surface and Coatings Technology

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In this work, TiN, ZrN and HfN thin films fabricated using glancing angle deposition (GLAD) technique are studied both experimentally and by numerical simulations. The films (1 µm thickness) were deposited by reactive magnetron sputtering at 0.3 Pa and 300°C on Si substrates inclined at α=85° with respect to the target. The film morphology and crystal structure were characterized by scanning electron microscopy, atomic force microscopy and Xray diffraction (XRD), including pole figure measurements. The wettability of these coatings was investigated using the sessile drop method with three different liquids. It is shown that TiN, ZrN and HfN films have a cubic, NaCl-type crystal structure with a [111] out-of-plane orientation and exhibit a biaxial texture. XRD pole figures reveal that the crystal habit of the grains consists of {100} facets constituting triangular-base pyramids. The films develop columnar microstructures, with typical column widths of ~ 100 nm. The tilt angle β of the columns is found to increase from 24.5, 31.5 to 34° for TiN, ZrN and HfN films, respectively. Atomistic computations of the growth of these nitrides at glancing angle using a kinetic Monte Carlo model reveal that the growth morphology and variation in column tilt angle is well reproduced by considering the difference in the angular distribution of the sputtered particles.This study also shows that GLAD films are hydrophilic comparatively to the same films deposited at near-normal incidence, and among the three nitrides, TiN is the more wettable coating.

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“…The grains that are initially deposited on the substrate form a shadow with respect to the incoming vapor flux so the flux atoms that are deposited on the grains obliquely form nanorods. The absorption of a glancing angle-deposited TiN nanorod array (NRA) has been demonstrated to vary with the deposition parameters 24 .…”

Section: Introductionmentioning

confidence: 99%

Deposited ultra-thin titanium nitride nanorod array as a plasmonic near-perfect light absorber

Jen

Yang

Lin

et al. 2020

Sci Rep

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The transmittance, reflectance, and extinctance that correspond to the localized plasmonic resonance within TiN nanorods were investigated. The obliquely deposited TiN nanorod array shows polarization-independent admittance matching to air. Unlike noble metal nanorods, the near-field localized longitudinal and transverse plasmonic resonance of TiN nanorod arrays present polarization-dependent light extinction in the far field. The longitudinal plasmonic mode presents stronger extinction than transverse plasmonic mode. In order to have high efficient light absorption, an ultra-thin two-layered TiN nanorod array was fabricated with orthogonal deposition planes for upper layer and bottom layer to absorb different polarized light energy. The measured spectrum shows broadband and wide-angle light extinction.

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Tunable Plasmonic Resonances in TiN Nanorod Arrays

Cited by 5 publications

References 25 publications

Obliquely Bideposited TiN Thin Film with Morphology-Dependent Optical Properties

Obliquely Bideposited TiN Thin Film with Morphology-Dependent Optical Properties

Study of columnar growth, texture development and wettability of reactively sputter-deposited TiN, ZrN and HfN thin films at glancing angle incidence

Deposited ultra-thin titanium nitride nanorod array as a plasmonic near-perfect light absorber

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