Deposited ultra-thin titanium nitride nanorod array as a plasmonic near-perfect light absorber

Jen, Yi‐Jun; Yang, Kai‐Bin; Lin, Po‐Chun; Chung, Meng-Hsun

doi:10.1038/s41598-020-79399-4

Cited by 8 publications

(2 citation statements)

References 30 publications

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“…Therefore, some refractory metallic materials become excellent candidates, such as titanium. It has been reported that an average absorption of more than 95% in the wavelength range of 400 nm-900 nm was achieved by using titanium [17][18][19]. As a refractory material, the melting point of metal titanium is as high as 1668 • C. Because of its excellent optical loss characteristics, titanium shows a higher light absorption efficiency in a fairly broad wavelength range.…”

Section: Introductionmentioning

confidence: 99%

Ultra-Broadband, Polarization-Irrelevant Near-Perfect Absorber Based on Composite Structure

Meng

Liu

et al. 2022

Micromachines

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This paper proposes a near-perfect absorption device based on a cross-shaped titanium nanostructure and a multilayered structure. The multilayered bottom structure consists of alternately SiO2 and Ti. The whole device is put on a TiN substrate. The coupling between cross-shaped titanium nanostructures, and that between the cross-shaped titanium nanostructure and bottom multilayer, can further enhance the absorption at some wavelength where most of the energy is reflected or passes through in the device with a single structure. According to the simulation results, the device presents a nearly perfect absorption in a wavelength range from 300 nm to 2000 nm. The average absorptance in the wavelength range from 500 nm to 1400 nm exceeds 96%. This paper also provides a new idea for realizing perfect absorption, which is extensively used in sensing, controllable thermal emission, solar energy harvesting solar thermo-photovoltaic devices, and optoelectronic metrology.

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Section: Introductionmentioning

confidence: 99%

Ultra-Broadband, Polarization-Irrelevant Near-Perfect Absorber Based on Composite Structure

Meng

Liu

et al. 2022

Micromachines

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“…Due to plasmonic effects, TiN nano-square rings [12] are regularly distributed on SiO 2 films that are coated on silicon to provide high absorptance for visible wavelengths. Like TiN nanosquare ring arrays, glancing-angle deposited TiN nanorod arrays also exhibit broadband and wide-angle admittance matching [13].…”

Section: Introductionmentioning

confidence: 99%

Obliquely Bideposited TiN Thin Film with Morphology-Dependent Optical Properties

Jen

Lin

2021

Coatings

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TiN thin films were obliquely bideposited with different subdeposit thicknesses. The morphology of the bideposited film was varied from a nano-zigzag array to a vertically grown columnar structure by reducing the subdeposit thickness. The principal index of refraction and extinction coefficient were obtained to explain the measured reflectance and transmittance spectra. The loss of the bideposited thin film decreased as the thickness of the subdeposit decreased. The principal indices for normal incidence were near or under unity, indicating the low reflection by the bideposited thin films. A TiN film with a subdeposit thickness of 3 nm demonstrated an average index of refraction of 0.83 and extinction coefficient of below 0.2 for visible wavelengths. The retrieved principal refractive indexes explained the anisotropic transmission and reflection. For most normal incident cases, the analysis offers the tunable anisotropic property of a TiN nanostructured film for multilayer design in the future.

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Reusability, Long‐Life Storage and Highly Sensitive Zirconium Nitride (ZrN) Surface‐Enhanced Raman Spectroscopy (SERS) Substrate Fabricated by Reactive Gas‐Timing Rf Magnetron Sputtering

Sucheewa,

Wongwiriyapan,

Rattanawarinchai

et al. 2023

Adv Materials Inter

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Transition metal nitrides (TMN) are promising material alternative to replace noble metals in the field of plasmonic applications, especially surface‐enhanced Raman spectroscopy (SERS). Here we demonstrate a practical surface enhanced Raman spectroscopy (SERS) substrate using zirconium nitride (ZrN) thin films grown by reactive gas‐timing (RGT) rf magnetron sputtering. The tailored properties of ZrN thin film exploited for SERS activity could be achieved to obtain a highly sensitive ZrN thin film SERS substrate with the enhancement factor (EF) of 1.24 × 106 and 4.8 %RSD at 1626 cm‐1 toward methylene blue (MB) analyte which are comparable to the optimized Au sputtered thin films (EF=1.18 × 106 and with 5.1%RSD). We find that the spatial plasmonic hotspots on the surface of ZrN SERS substrate controlled by the turn‐on timing of Ar:N2 sputtered gas sequence, leading to the discrete conductive surface profile, strongly relates to non‐stoichiometric composition and the degree of (200)‐oriented texture at the surface of ZrN thin film. Furthermore, ZrN thin film SERS substrates exhibit an excellent recyclability more than 30 cycles with simple cleaning process and a storage time longer than 6 months. The detection and reusability of ZrN SERS substrate on the low concentration of trinitrotoluene (TNT) for homeland security are also performed.

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Deposited ultra-thin titanium nitride nanorod array as a plasmonic near-perfect light absorber

Cited by 8 publications

References 30 publications

Ultra-Broadband, Polarization-Irrelevant Near-Perfect Absorber Based on Composite Structure

Ultra-Broadband, Polarization-Irrelevant Near-Perfect Absorber Based on Composite Structure

Obliquely Bideposited TiN Thin Film with Morphology-Dependent Optical Properties

Reusability, Long‐Life Storage and Highly Sensitive Zirconium Nitride (ZrN) Surface‐Enhanced Raman Spectroscopy (SERS) Substrate Fabricated by Reactive Gas‐Timing Rf Magnetron Sputtering

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