This paper presents a comparative investigation of the electronic properties of un-, Au-, (Au, O) co-doped monolayer MoS 2 to analysis the effect of oxygen element on the electronic properties of Au-S bonding, with the goal of improving the conductivity of Au-S bonding of monolayer MoS 2 nanodevice with electrode Au. ABSTRACT: Improving the electronic properties of Au-S bonding is the key to tuning the carrier transport of monolayer MoS 2 -based nanodevice. Here, we systemically investigate the electronic properties for Au-, O-, and (Au, O) co-doped monolayer MoS 2 to analysis the electronic properties of Au-S bondings by using first-principles density functional calculations. Three gap states induced by Au-S bondings are observed at the band gap in Au-doped and (Au, O) co-doped monolayer MoS 2 , which are n-type semiconductors. Moreover, the n-type barrier between the Fermi level of Au-and (Au, O) co-doped systems and the CBM of un-doped monolayer MoS 2 are 0.84 and 0.65 eV, respectively. In addition, low electron density and electron density difference are observed for Au-S bondings in Au-doped monolayer MoS 2 , suggesting weak covalent Au-S bondings with high resistance, which explains the observed low carrier mobility of monolayer MoS 2 device with Au electrode. Upon introducing O element into Au-doped monolayer MoS 2 , electron density and electron density difference of Au-S bondings in (Au, O) co-doped monolayer MoS 2 are increased to 0.58 and 0.15 eV/Å 3 , respectively, showing that the covalent Au-S bondings are strengthened, and their resistance and electron injection efficiency are further improved by dopant O element. Our findings may provide an effective way to improve the electronic properties of Au-S bondings in monolayer MoS 2 -based nanodevice with Au electrode. system is weak. Our findings provide an effective way to improve the electronic properties of Au-S bondings monolayer MoS 2 -based nanodevice with electrode Au. Effect of substrate temperature on the electrical characteristics of MoSex thin films and back-gated MoSex transistors. J.Alloy. Compd. 2015, 623, 209-212.