2006
DOI: 10.1016/j.ssc.2006.05.003
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Trap-controlled behavior in ultrathin Lu2O3 high-k gate dielectrics

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Cited by 18 publications
(14 citation statements)
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“…Oxide films prepared by pulsed laser deposition in an oxygen-deficient chamber contain a great deal of oxygen vacancies. [28][29][30] The total DOS of the cubic Lu 2 O 3 supercells with and without oxygen vacancy are plotted in the Fig. 7.…”
Section: Resultsmentioning
confidence: 99%
“…Oxide films prepared by pulsed laser deposition in an oxygen-deficient chamber contain a great deal of oxygen vacancies. [28][29][30] The total DOS of the cubic Lu 2 O 3 supercells with and without oxygen vacancy are plotted in the Fig. 7.…”
Section: Resultsmentioning
confidence: 99%
“…17 Other deposition methodology has been explored, such as high temperature oxidation of metallic films, ultrahigh vacuum electron-beam deposition, 17 and atomic layer deposition. 18 In our recent work, 19 the effect of N 2 and O 2 annealing ambients and the effect of light illumination on electrical behavior of Lu 2 O 3 were reported. A method to form nanodots embedded in Lu 2 O 3 using pulsed laser deposition for memory device application was also demonstrated.…”
Section: Introductionmentioning
confidence: 98%
“…In this class, films of rare earth metal oxides (REO) and transition metal oxides are alternative candidates for the mentioned above applications and are currently intensively being examined [8][9][10][11][12][13][14][15][16][17]. Lutetium oxide (Lu 2 O 3 ) belongs to the REO group.…”
Section: Introductionmentioning
confidence: 99%
“…Lutetium oxide (Lu 2 O 3 ) belongs to the REO group. Thin films of Lu 2 O 3 have been recently extensively examined [13][14][15][16][17]. Dielectric and electrical studies have been carried out on samples with MIS-type and MIM-type electrodes configuration.…”
Section: Introductionmentioning
confidence: 99%