2006
DOI: 10.1063/1.2357847
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Transport study of a single bismuth nanowire fabricated by the silver and silicon nanowire shadow masks

Abstract: Nanofabrication of high aspect ratio (50:1) sub-10nm silicon nanowires using inductively coupled plasma etching J. Vac. Sci. Technol. B 30, 06FF02 (2012); 10.1116/1.4755835Fabrication of ferromagnetic single-electron tunneling devices by utilizing metallic nanowire as hard mask stencil Fabrication of nanometer size photoresist wire patterns with a silver nanocrystal shadowmask

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Cited by 37 publications
(19 citation statements)
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“…The main reason for the lack of four-probe measurements on individual NW is the difficulty in making good electrical Ohmic contacts due to a native 10 nm thick Bi oxide coating that forms on the surface of the NWs. 10 Over last years, some research groups succeeded 10,11 although their studies focused on absolute resistivity without further fundamental transport properties such as MR. Recently, Shim et al 12 carried out magnetotransport properties of an individual single-crystalline ͑its axis oriented along the trigonal direction ͓001͔͒ 400-nm-diameter Bi NW.…”
Section: Weak-antilocalization Signatures In the Magnetotransport Promentioning
confidence: 99%
“…The main reason for the lack of four-probe measurements on individual NW is the difficulty in making good electrical Ohmic contacts due to a native 10 nm thick Bi oxide coating that forms on the surface of the NWs. 10 Over last years, some research groups succeeded 10,11 although their studies focused on absolute resistivity without further fundamental transport properties such as MR. Recently, Shim et al 12 carried out magnetotransport properties of an individual single-crystalline ͑its axis oriented along the trigonal direction ͓001͔͒ 400-nm-diameter Bi NW.…”
Section: Weak-antilocalization Signatures In the Magnetotransport Promentioning
confidence: 99%
“…The observed trends generally agree with previous measurements. [14][15][16][17] The 200-nm wires yielded 6 bulklike metallic behavior (dR/dT > 0) and decreased mobility through boundary scattering, whereas the R for the 50-nm, 30-nm and 20-nm wires increased monotonically with decreasing temperature, suggesting a thermally activated charge carrier density, and saturates at low temperatures. The contrast between the diameter-dependent behaviors supports the conclusion from theory regarding the SMSC transition occuring at around 50 nm.…”
Section: Resistance and Thermopowermentioning
confidence: 99%
“…In ref. (11), bismuth nanowires were patterned with cross sections of 40×30 and 40×50 nm 2 . Electrical measurements indicate that the wires were indeed below the semimetal-to-semiconductor critical dimension.…”
mentioning
confidence: 99%