Platinum diselenide (PtSe) is a group-10 transition metal dichalcogenide (TMD) that has unique electronic properties, in particular a semimetal-to-semiconductor transition when going from bulk to monolayer form. We report on vertical hybrid Schottky barrier diodes (SBDs) of two-dimensional (2D) PtSe thin films on crystalline n-type silicon. The diodes have been fabricated by transferring large-scale layered PtSe films, synthesized by thermally assisted conversion of predeposited Pt films at back-end-of-the-line CMOS compatible temperatures, onto SiO/Si substrates. The diodes exhibit obvious rectifying behavior with a photoresponse under illumination. Spectral response analysis reveals a maximum responsivity of 490 mA/W at photon energies above the Si bandgap and relatively weak responsivity, in the range of 0.1-1.5 mA/W, at photon energies below the Si bandgap. In particular, the photoresponsivity of PtSe in infrared allows PtSe to be utilized as an absorber of infrared light with tunable sensitivity. The results of our study indicate that PtSe is a promising option for the development of infrared absorbers and detectors for optoelectronics applications with low-temperature processing conditions.

In this work, we present a comprehensive theoretical and experimental study of quantum confinement in layered platinum diselenide (PtSe 2 ) films as a function of film thickness. Our electrical measurements, in combination with density functional theory calculations, show distinct layer-dependent semimetal-to-semiconductor evolution in PtSe 2 films, and highlight the importance of including van der Waals interactions, Green's function calibration, and screened Coulomb interactions in the determination of the thickness-dependent PtSe 2 energy gap. Large-area PtSe 2 films of varying thickness (2.5-6.5 nm) were formed at 400°C by thermally assisted conversion of ultra-thin platinum films on Si/SiO 2 substrates. The PtSe 2 films exhibit p-type semiconducting behavior with hole mobility values up to 13 cm 2 /V·s. Metal-oxide-semiconductor field-effect transistors have been fabricated using the grown PtSe 2 films and a gate field-controlled switching performance with an I ON /I OFF ratio of >230 has been measured at room temperature for a 2.5-3 nm PtSe 2 film, while the ratio drops to <2 for 5-6.5 nm-thick PtSe 2 films, consistent with a semiconductingto-semimetallic transition with increasing PtSe 2 film thickness. These experimental observations indicate that the low-temperature growth of semimetallic or semiconducting PtSe 2 could be integrated into the back-end-of-line of a silicon complementary metaloxide-semiconductor process.npj 2D Materials and Applications (2019) 3:33 ; https://doi.

Type of publicationArticle (peer-reviewed) Microscopy (TEM) cross-sectional analysis, which showed hemispeherical-shaped surface blisters that are amorphous in nature approximately 180-240 nm tall and 420-540 nm wide, after 5 months of air exposure, as well as surface deformation in regions between these structures, related to surface oxidation. An X-ray photoelectron spectroscopy (XPS) study of atmosphere exposed HfSe2 was conducted over various time scales which indicated the Hf undergoes preferential reaction with oxygen as compared to the Se. Energy-Dispersive XRay Spectroscopy (EDX) showed that the blisters are Se-rich, thus it is theorised that HfO2 forms when the HfSe2 reacts in ambient, which in turn causes the Se atoms to be aggregated at the surface in the form of blisters. Overall it is evident that air contact drastically affects the structural properties of TMD materials. This issue poses one of the biggest challenges for future TMD-based devices and technologies.2

Platinum diselenide (PtSe 2 ) field-effect transistors with ultrathin channel regions exhibit p-type electrical conductivity that is sensitive to temperature and environmental pressure. Exposure to a supercontinuum white light source reveals that positive and negative photoconductivity coexists in the same device. The dominance of one type of photoconductivity over the other is controlled by environmental pressure. Indeed, positive photoconductivity observed in high vacuum converts to negative photoconductivity when the pressure is raised. Density functional theory calculations confirm that physisorbed oxygen molecules on the PtSe 2 surface act as acceptors. The desorption of oxygen molecules from the surface, caused by light irradiation, leads to decreased carrier concentration in the channel conductivity. The understanding of the charge transfer occurring between the physisorbed oxygen molecules and the PtSe 2 film provides an effective route for modulating the density of carriers and the optical properties of the material.

The advent of two-dimensional materials has opened a plethora of opportunities in accessing ultrascaled device dimensions for future logic and memory applications. In this work, we demonstrate that a single layer of large-area chemical vapor deposition-grown molybdenum disulfide (MoS2) sandwiched between two metal electrodes can be tuned to show multilevel nonvolatile resistive memory states with resistance values separated by 5 orders of magnitude. The switching process is unipolar and thermochemically driven requiring significant Joule heating in the reset process. Temperature-dependent electrical measurements coupled with semiclassical charge transport models suggest that the transport in these devices varies significantly in the initial (pristine) state, high resistance state, and low resistance state. In the initial state, the transport is a one-step direct tunneling (at low voltage biases) and Fowler Nordeim tunneling (at higher bias) with an effective barrier height of 0.33 eV, which closely matches the Schottky barrier at the MoS2/Au interface. In the high resistive state, trap-assisted tunneling provides a reasonable fit to experimental data for a trap height of 0.82 eV. Density functional theory calculations suggest the possibility of single- and double-sulfur vacancies as the microscopic origins of these trap sites. The temperature-dependent behavior of the set and reset process are explained by invoking the probability of defect (sulfur vacancy) creation and mobility of sulfur ions. Finally, conductive atomic force microscopy measurements confirm that the multifilamentary resistive memory effects are inherent to a single-crystalline MoS2 triangle and not necessarily dependent on grain boundaries. The insights suggested in this work are envisioned to open up possibilities for ultrascaled, multistate, resistive memories for next-generation digital memory and neuromorphic applications.