2014
DOI: 10.1016/j.apsusc.2014.05.220
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Trajectory effect on the properties of large area ZnO thin films deposited by atmospheric pressure plasma jet

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Cited by 16 publications
(4 citation statements)
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“…The capability of atmospheric-pressure plasma in large-area plasma polymerization to achieve these requirements has been demonstrated. 6,7) However, because of the high gas temperature in the discharge, the usage of atmospheric-pressure plasma discharges has yet to be completely realized compared with lowpressure plasma discharges. As a consequence, low-temperature atmospheric-pressure plasma polymerization systems are required.…”
Section: Introductionmentioning
confidence: 99%
“…The capability of atmospheric-pressure plasma in large-area plasma polymerization to achieve these requirements has been demonstrated. 6,7) However, because of the high gas temperature in the discharge, the usage of atmospheric-pressure plasma discharges has yet to be completely realized compared with lowpressure plasma discharges. As a consequence, low-temperature atmospheric-pressure plasma polymerization systems are required.…”
Section: Introductionmentioning
confidence: 99%
“…1. The detailed description of this system has been described in our previous paper [26]. Briefly, it consists of a plasma jet, a direct current (DC) pulsed power source, an ultrasonic atomizer, and a computer-controlled X-Y hot plate.…”
Section: Methodsmentioning
confidence: 99%
“…ZnO heavily doped with metals, such as Al, Ga and In, shows Fermi level degeneration and thus behaves metallic along with its high transparency [11]. Several methods have been developed to deposit ZnO films, including pulsed laser deposition [12], molecular-beam epitaxy [13], sputtering [14], plasma-enhanced chemical vapor deposition [15,16], metalorganic chemical vapor deposition [17,18], dip coating [19,20], spray pyrolysis [6,7,21], atomic layer deposition [18,[22][23][24], and atmospheric pressure plasma jet (APPJ) [25][26][27]. Among those methods, APPJ does not require a vacuum chamber, and is suitable for large-area devices such as solar cells and antireflective window coatings.…”
Section: Introductionmentioning
confidence: 99%
“…Since 1975 the four-point probe method has been established as a reference procedure of the American Society for Testing and Materials Standards in the microelectronics industry [2], and has been widely used for characterizing the electrical properties of thin films for many applications, such as solar cells [3,4], liquid crystal displays, light-emitting devices [5], flat panel displays [6] and a variety of microelectronics [7] and photovoltaics [8]. For example, the performance of thin-film solar cells depends greatly on the magnitude and uniformity of the electrical properties of a transparent conductive oxide (TCO) [9,10].…”
Section: Introductionmentioning
confidence: 99%