Effect of main gas and carrier gas on ZnO thin films deposited by atmospheric pressure plasma jet

Chou, Tung Sheng; Lin, Hsi Hsun; Chen, Yu Yi; Pan, Kuo-Long; Juang, Jia-Yang

doi:10.1016/j.tsf.2015.05.050

Cited by 11 publications

(4 citation statements)

References 39 publications

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“…156 Chou et al observed lower sheet resistance in their Ga-ZnO lms prepared using an atmospheric plasma jet when H 2 gas was included, which was believed to cause the formation of shallow donor states in ZnO. 157 Thus in our case, the crystallinity of the nTPs and NPs, as evidenced by TEM-SAED and XRD, could be due to other energetic species in the microplasma aerglow.…”

Section: Formation Mechanism Of Zno Ntps/nps From Microplasmamentioning

confidence: 53%

Non-equilibrium defect chemistry in oxygen-rich zinc oxide nano-tetrapods synthesized using atmospheric pressure microplasma

Padmanaban,

Maguire,

Mariotti

2024

J. Mater. Chem. A

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Section: Formation Mechanism Of Zno Ntps/nps From Microplasmamentioning

confidence: 53%

Non-equilibrium defect chemistry in oxygen-rich zinc oxide nano-tetrapods synthesized using atmospheric pressure microplasma

Padmanaban,

Maguire,

Mariotti

2024

J. Mater. Chem. A

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“…The enhancement in crystallinity increases both carrier mobility and carrier concentration and results in a decrease of resistivity, a drastically opposite behavior to AZO. Also, these authors showed the influence of the texture of the SiO x sub‐layer on the haze value of the stack GZO/ SiO x in the visible and near‐infrared regions, rougher surfaces contributing to increase the haze . Then, APPJ is an effective method for preparing textured TCO.…”

Section: Photovoltaic Materials By Atmospheric Pressure Plasmasmentioning

confidence: 99%

“…Also, these authors showed the influence of the texture of the SiO x sub-layer on the haze value of the stack GZO/ SiO x in the visible and near-infrared regions, rougher surfaces contributing to increase the haze. [108] Then, APPJ is an effective method for preparing textured TCO.…”

Section: Transparent Conductive Contactsmentioning

confidence: 99%

Low‐Temperature Atmospheric Pressure Plasma Processes for “Green” Third Generation Photovoltaics

Mariotti

Belmonte

Benedikt

et al. 2016

Plasma Processes & Polymers

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Atmospheric pressure plasmas (APPs) have achieved great scientific and technological advances for a wide range of applications. The synthesis and treatment of materials by APPs have always attracted great attention due to potential economic benefits if compared to low-pressure plasma processes. Nonetheless, APPs present very distinctive features that suggest atmospheric pressure operation could bring other benefits for emerging new technologies. In particular, materials synthesized by APPs which are suitable candidates for third generation photovoltaics are reviewed here.

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“…Since 1975 the four-point probe method has been established as a reference procedure of the American Society for Testing and Materials Standards in the microelectronics industry [2], and has been widely used for characterizing the electrical properties of thin films for many applications, such as solar cells [3,4], liquid crystal displays, light-emitting devices [5], flat panel displays [6] and a variety of microelectronics [7] and photovoltaics [8]. For example, the performance of thin-film solar cells depends greatly on the magnitude and uniformity of the electrical properties of a transparent conductive oxide (TCO) [9,10].…”

Section: Introductionmentioning

confidence: 99%

Finite element analysis and equivalent parallel-resistance model for conductive multilayer thin films

Chen

Juang

2016

Meas. Sci. Technol.

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The standard collinear four-point probe method is an indispensable tool and has been extensively used for characterizing conductive thin films with homogeneous and isotropic electrical properties. In this paper, we conduct three-dimensional (3D) finite element simulations on conductive multilayer films to study the relationship between the reading of the four-point probe and the conductivity of the individual layers. We find that a multilayer film may be modeled as a simple equivalent circuit with multiple resistances, connected in parallel for a wide range of resistivity and thickness ratios, as long as its total thickness is smaller than approximately half of the probe spacing. As a result, we may determine the resistivity of each layer sequentially by applying the four-point probe, with the original correction factor π/ln(2), after deposition of each layer.

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Effect of main gas and carrier gas on ZnO thin films deposited by atmospheric pressure plasma jet

Cited by 11 publications

References 39 publications

Non-equilibrium defect chemistry in oxygen-rich zinc oxide nano-tetrapods synthesized using atmospheric pressure microplasma

Non-equilibrium defect chemistry in oxygen-rich zinc oxide nano-tetrapods synthesized using atmospheric pressure microplasma

Low‐Temperature Atmospheric Pressure Plasma Processes for “Green” Third Generation Photovoltaics

Finite element analysis and equivalent parallel-resistance model for conductive multilayer thin films

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