2014
DOI: 10.1117/1.jmm.13.3.033001
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Total internal reflection–based module for fluorescence and absorbance detection

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Cited by 7 publications
(23 citation statements)
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“…Misalignment of the chip should hence not deviate the excitation beam. (iii) The system presented in our previous work [11,12] was highly sensitive to presence of air bubbles. In case one or more air bubbles were present, the measurement had to be repeated.…”
Section: Optofluidic Chip Designmentioning
confidence: 97%
“…Misalignment of the chip should hence not deviate the excitation beam. (iii) The system presented in our previous work [11,12] was highly sensitive to presence of air bubbles. In case one or more air bubbles were present, the measurement had to be repeated.…”
Section: Optofluidic Chip Designmentioning
confidence: 97%
“…Because the reaction principle is based on enzyme inhibition, temperature should be considered . For the process of reflection absorbance detection, the more appropriate the wavelength of the detected light the better . When the liquid solution flows inside the chip using surface tension, the influence of gravity should not be ignored .…”
Section: Microfluidic Detection Device Driven By Liquid Surface Tensionmentioning
confidence: 99%
“…According to the color of the reaction product in the pesticide test, the illumination detector should be determined to optimize the reflection absorption effect. Only the appropriate wavelength range can truly capture the proportional relationship between the pesticide concentration and the light absorption . Therefore, the test was carried out on a paper‐based microfluidic chip using pesticide sample reagents at concentrations of 0.1, 0.15, 0.25, 0.3, and 0.4 mg/L.…”
Section: Microfluidic Detection Device Driven By Liquid Surface Tensionmentioning
confidence: 99%
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“…This mask can stop protons with an energy of up to 16.5 MeV, 14 enabling irradiation of PMMA substrates that are up to 2 mm thick. 15 The concept of DPW is based on the fact that irradiating high-molecular-weight PMMA with highly energetic protons will break the long polymer chains. This can be exploited because it changes the physical and chemical material properties of the unexposed bulk material, allowing these irradiated zones to be selectively etched away.…”
Section: Prototyping By Deep Proton Writingmentioning
confidence: 99%