1998
DOI: 10.1109/23.685223
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Total dose hardness of three commercial CMOS microelectronics foundries

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Cited by 45 publications
(22 citation statements)
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“…On the other hand, the open-layout NMOS transistors were affected by TID, as typically observed in any commercial technology [10]. As shown in Fig.…”
Section: A Core Transistorsmentioning
confidence: 79%
“…On the other hand, the open-layout NMOS transistors were affected by TID, as typically observed in any commercial technology [10]. As shown in Fig.…”
Section: A Core Transistorsmentioning
confidence: 79%
“…Since gate oxides in present day submicron CMOS technologies are in this range, they are becoming increasingly radiation tolerant. This has been confirmed on commercial-grade CMOS processes in several works [3,4]. Ionising radiation can nevertheless induce positive charge trapping in the still thick field and lateral oxides of modern CMOS technologies, opening up leakage current paths that can lead to device failure after a moderate level of total dose, of the order of 10-40 krad.…”
Section: Radiation Tolerant Design Approachmentioning
confidence: 80%
“…Fortunately, as integrated circuit technology inexorably moves to smaller feature sizes the TID damage becomes less serious [59,60]. Very thin gate oxides provide a smaller volume for accumulated positive charge, and the improved quality of the interface between the oxide and the substrate results in fewer interface states.…”
Section: Total Ionizing Dose Effectsmentioning
confidence: 99%