Titanium nitrade film formation by the dynamic ion beam mixing method

Nakagawa, Yoshiro; Ohtani, S.; Nakata, Takao; Mikoda, M.; Takagi, Toshinori

doi:10.1016/0168-583x(93)90808-j

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Physical Vapor Deposition (Pvd) Techniques1

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2018

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Cited by 10 publications

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“…Ion beam assisted deposition (IBAD) is a technique that usually combines sputtering or electron beam evaporation with the ion implantation concurrent ion beam bombardment, producing a final coating with a highly intermixed interface [110] and with a less built-in strain compared to other PVD techniques [28,[111][112][113]. The effect of IBAD on the coating depends on many parameters such as: (i) ion energy, (ii) ion to atom arrival ratio, (iii) angle of ion incidence, (iv) pressure, and (v) temperature [114].…”

Section: Physical Vapor Deposition (Pvd) Techniquesmentioning

confidence: 99%

Wear resistance investigation of titanium nitride-based coatings

Santecchia

Hamouda

Musharavati

et al. 2015

Ceramics International

244

108

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Section: Physical Vapor Deposition (Pvd) Techniquesmentioning

confidence: 99%

Wear resistance investigation of titanium nitride-based coatings

Santecchia

Hamouda

Musharavati

et al. 2015

Ceramics International

244

108

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Ion Beam Assisted Deposition Induced Composition Changes in Titanium Nitride

Gerlach

Wengenmair

Hartmann

et al. 1996

Phys. Stat. Sol. (a)

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Titanium nitride films were produced by a newly developed photon and ion beam assisted deposition system (PHIBAD system). With an electron beam evaporator titanium was deposited on silicon substrates in a controlled nitrogen environment. Optionally, the growing films were bombarded with argon or nitrogen ions and/or illuminated with UV light. With these procedures δ‐TiN films with distinct chemical composition were formed. The composition determination was done with elastic recoil detection analysis (ERDA) to avoid the problems usually occurring with standard methods like AES. The results demonstrate that both impurity content and nitrogen to titanium ratio of the films are dependent on the ion current density. UV light illumination also has a positive influence on film composition. Generally, a certain energy transfer to the growing film is necessary to cause composition changes.

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