2019
DOI: 10.1126/sciadv.aax0939
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TiO 2 metasurfaces: From visible planar photonics to photochemistry

Abstract: TiO2 metasurfaces have been intensively studied in the past few years. To date, the TiO2 metadevices only used their high reflective index (n). The controllable light extinction coefficient (k) of TiO2 has not been exploited yet. Here, we converted TiO2 metasurfaces to black TiO2 metasurfaces and explored their new opportunities in photochemistry. A complementary metal oxide semiconductor (CMOS)–compatible technique has been developed to reversibly and precisely control the absorption of TiO2 metasurfaces with… Show more

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Cited by 113 publications
(116 citation statements)
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References 38 publications
(49 reference statements)
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“…More than the wavelength shift, the FWHMs of main peaks are around 34-40 nm in Fig. 3c, close to the FWHM of TiO 2 metasurfaces 30,43 and 40% narrower than the ones in air (see Fig. 3b).…”
Section: Refractive Index Matching Layersupporting
confidence: 62%
“…More than the wavelength shift, the FWHMs of main peaks are around 34-40 nm in Fig. 3c, close to the FWHM of TiO 2 metasurfaces 30,43 and 40% narrower than the ones in air (see Fig. 3b).…”
Section: Refractive Index Matching Layersupporting
confidence: 62%
“…Vertical depth profile of the carrier concentration modulation of the films is uniform in our devices but could potentially be controlled by grey scale lithography to create a whole new category of materials. [54] Other materials amenable to local carrier concentration include TiO 2 [55] or 2D transition metal dichalcogenides (TDMC) such as MoS 2 [56,57] which could be the topic of future investigations. We believe that plasma patterning techniques have broad potentials for electronic and photonic applications to achieve novel structures once unimaginable or beyond the existing manufacture capability.…”
Section: New Methods For Achieving High-quality Conducting Oxide Metamentioning
confidence: 99%
“…Wu et al (30) introduced a CMOS (complementary metal-oxide semiconductor)-compatible technique to alter the absorption properties of functional dielectric TiO 2 metasurfaces for dynamic color generation. In contrast to the WO 3 -based switching strategies, oxidation and reduction were realized by implanting H + ions and O − ions in an inductively coupled plasma etcher, respectively.…”
Section: Other Functional Materialsmentioning
confidence: 99%
“…The optical properties of magnesium (Mg) and magnesium hydride (MgH 2 ), respectively, for example, can be reversibly controlled by hydrogenation and dehydrogenation, suggesting Mg as a plasmonically active ( 26 ), functional material for dynamic color control ( 14 , 27 29 ). In analogy to plasmonic coloration, structural colors produced by dielectric metasurfaces can be actively controlled by the intrinsic optical properties, e.g., the absorption of the dielectric material ( 30 ).…”
Section: Dynamic Plasmonic Color Generationmentioning
confidence: 99%
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