Time-modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species

Samukawa, Seiji; Furuoya, Shuichi

doi:10.1063/1.110586

Cited by 117 publications

(63 citation statements)

References 7 publications

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“…The pulse discharge has been sometimes used in diagnostic measurements; 3,4 however, some interesting results for material processing have been also reported. [5][6][7][8][9][10][11][12][13][14][15][16][17] The control of electron energy was also demonstrated in a microwave discharge tube 18 and time resolved measurements of electron temperature were carried out in an electron cyclotron resonance ͑ECR͒ discharge. 19 The pulse modulated ECR discharge has been also applied for CVD 15,16 or etching.…”

Section: S Okadamentioning

confidence: 99%

Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films

Hatta

Kadota

Mori

et al. 1995

Applied Physics Letters

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Articles you may be interested inModeling and analysis of hydrogen-methane plasma in electron cyclotron resonance chemical vapor deposition of diamond-like carbon J. Appl. Phys. 91, 40 (2002); 10.1063/1.1421038Microstructural studies of diamond thin films grown by electron cyclotron resonance-assisted chemical vapor deposition A new nucleation method by electron cyclotron resonance enhanced microwave plasma chemical vapor deposition for deposition of (001)-oriented diamond films Deposition of diamond-like carbon films using the screen grid method in electron cyclotron resonance chemical vapor deposition Role of oxygen in the electron cyclotron resonance plasmaassisted chemical vapor deposition of diamond films

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Section: S Okadamentioning

confidence: 99%

Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films

Hatta

Kadota

Mori

et al. 1995

Applied Physics Letters

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“…In principle, non-stationary excitation conditions caused by time dependent energy supply into the plasma can be used to manipulate the density and energy distribution of electrons and to achieve modified chemical equilibria [18,19]. As a result with pulsed plasmas higher chemical conversion rates but also improved etching and deposition processes can be realized [20][21][22][23][24].…”

Section: Introductionmentioning

confidence: 99%

Langmuir probe diagnostic studies of pulsed hydrogen plasmas in planar microwave reactors

Rousseau

Teboul²,

Lang

et al. 2002

Journal of Applied Physics

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Langmuir probe techniques have been used to study time and spatially resolved electron densities and electron temperatures in pulse-modulated hydrogen discharges in two different planar microwave reactors (f microwave = 2.45 GHz, t pulse = 1 ms). The reactors are (i) a standingwave radiative slotted waveguide reactor and (ii) a modified travelling-wave radiative slotted waveguide reactor, which generate relatively large plasmas over areas from about 350 cm 2 to 500 cm 2 . The plasma properties of these reactor types are of particular interest as they have been used for basic research and for plasma processing, e.g. for surface treatment and layer deposition. In the present study the pressures and microwave powers in the reactors were varied between 33 and 55 Pa and 600 and 3600 W, respectively. In regions with high electromagnetic fields shielded Langmuir probes were used to avoid disturbances of the probe characteristic. Close to the microwave windows of the reactors both the electron density and the electron temperature showed strong inhomogeneities. In the standing-wave reactor the inhomogeneity was found to be spatially modulated by the position of the slots. The maximum value of the electron temperature was about 10 eV and the electron density varied between 0.2 and 14×10 11 cm -3 . The steady state electron temperature in a discharge pulse was reached within a few tens of microseconds whereas the electron density needed some hundreds of microseconds to reach a steady state. Depending on the reactor the electron density reached a maximum between 80 and 200 µs after the beginning of the pulse.2

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“…However, it is quite difficult to change the electron energy in weakly ionized plasma because the particle balance between the plasma generation and loss automatically determines the electron temperature. Therefore, the electron temperature is not simply changed by the input power at a fixed pressure [20]. We here change the particle balance by separating the discharge spatially under a constant gas pressure [21].…”

Section: Electron Temperature Control Of Plasmasmentioning

confidence: 98%

Production of large-diameter uniform plasmas and control of electron temperature

Iizuka

Sato

2000

Elect. Eng. Jpn.

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Time-modulated electron cyclotron resonance plasma discharge for controlling generation of reactive species

Cited by 117 publications

References 7 publications

Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films

Pulse modulated electron cyclotron resonance plasma for chemical vapor deposition of diamond films

Langmuir probe diagnostic studies of pulsed hydrogen plasmas in planar microwave reactors

Production of large-diameter uniform plasmas and control of electron temperature

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