Production of large-diameter uniform plasmas and control of electron temperature

Iizuka, Satoru; Sato, Noriyoshi

doi:10.1002/(sici)1520-6416(200001)130:1<1::aid-eej1>3.0.co;2-r

Cited by 9 publications

(4 citation statements)

References 16 publications

(17 reference statements)

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“…In this way, low-T e plasma is produced in region II by employing the grid method. 6,10) Dependences of plasma parameters T e , V s , and n e on the pressure in the chamber are shown in Fig. 3.…”

Section: Resultsmentioning

confidence: 99%

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Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH₄/H₂ Plasma

Emi¹,

Kato²,

Abe

et al. 2006

Jpn. J. Appl. Phys.

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In this study, we investigate the effects of electron temperature T e on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH4/H2 plasma. We find that nanoparticles are produced in low-T e plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-T e plasma. This implies that a reduction in the CH2/CH3 radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.

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Section: Resultsmentioning

confidence: 99%

“…We have found a novel method for controlling the electron energy distribution function in order to reduce the higher-order dissociation of CH 4 . 6) This technique has been applied to CH 4 /H 2 plasma for diamond deposition. Highquality diamonds and nanocrystalline diamonds [7][8][9] have been produced in low-T e plasma using grid methods.…”

Section: Introductionmentioning

confidence: 99%

Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH₄/H₂ Plasma

Emi¹,

Kato²,

Abe

et al. 2006

Jpn. J. Appl. Phys.

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“…Especially, nanocrystalline diamonds have superior potential in the surface tribology for producing flat, hard, smooth, and low friction surfaces [1]. In plasma enhanced chemical vapor depositions (PECVD), electron temperature T e has to be controlled because T e drastically affects the quality of deposited films [2]. Especially, low T e plasma is required to reduce excess dissociation of source gas.…”

Section: Introductionmentioning

confidence: 99%

Nanocrystalline diamond deposition in electron-temperature-controlled CH4/H2/Ar plasma

Ikada

Kato²,

Abe

et al. 2006

Thin Solid Films

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“…Up to now, we have developed a grid method to control the electron temperature [9][10][11][12]. In the beginning, we used a negatively biased grid to vary the electron temperature in the downstream plasma region.…”

Section: Introductionmentioning

confidence: 99%

High quality diamond formation by electron temperature control in methane–hydrogen plasma

Shimizu

Iizuka²,

Kato

et al. 2003

Plasma Sources Sci. Technol.

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We report a new method for the nucleation and growth of diamonds by employing an electron-temperature control technique in CH 4 /H 2 radio frequency glow discharge plasma under a low gas pressure of 100 mTorr. The electron temperature in the plasma is controlled under constant gas pressure in a range from 0.5 to 2.5 eV continuously by changing the open area of the slits situated around a grid that is kept at the floating potential. It is observed that the film quality is changed in accordance with the variation of electron temperature, and we can produce high quality diamond in a low electron temperature plasma, even though usually only graphite film is deposited, unless the electron temperature is controlled.

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Production of large-diameter uniform plasmas and control of electron temperature

Cited by 9 publications

References 16 publications

Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH₄/H₂ Plasma

Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH₄/H₂ Plasma

Nanocrystalline diamond deposition in electron-temperature-controlled CH4/H2/Ar plasma

High quality diamond formation by electron temperature control in methane–hydrogen plasma

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Production of large-diameter uniform plasmas and control of electron temperature

Cited by 9 publications

References 16 publications

Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH4/H2 Plasma

Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH4/H2 Plasma

Nanocrystalline diamond deposition in electron-temperature-controlled CH4/H2/Ar plasma

High quality diamond formation by electron temperature control in methane–hydrogen plasma

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Product

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Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH₄/H₂ Plasma

Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH₄/H₂ Plasma