Formation of Nanoparticles by Control of Electron Temperature in Hollow-Typed Magnetron Radio Frequency CH₄/H₂ Plasma

Abstract

In this study, we investigate the effects of electron temperature T e on the production of nanoparticles by using the grid-biasing method in hollow-typed magnetron radio frequency (RF) CH4/H2 plasma. We find that nanoparticles are produced in low-T e plasma. On the other hand, thin film depositions, such as nanowalls, are mainly observed and almost no nanoparticles are created in high-T e plasma. This implies that a reduction in the CH2/CH3 radical ratio is important for producing nanoparticles, together with a reduction in sheath potential in front of the substrate. The change in electron temperature in plasma has a marked effect on film quality.

ZnO Nanowire Formation by Two-Step Deposition Method Using Energy-Controlled Hollow-Type Magnetron RF Plasma

“…Experimental apparatus [9,10] is schematically shown in Figure 1. Plasma was generated by a hollow-type magnetron (HTM) RF plasma source at frequency of 13.56 MHz [11,12]. The HTM consists of powered electrode made of stainless cylinder of 4.8 cm in diameter and 5.5 cm height, which is covered by a grounded stainless steel cylinder of 5.2 cm diameter and 6.0 cm height.…”