2002
DOI: 10.1088/0268-1242/17/8/316
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Tight-binding and k·p models for the electronic structure of Ga(In)NAs and related alloys

Abstract: We review how the tight-binding method provides a particularly useful approach to understand the electronic structure of GaInNAs alloys, and use it to derive a modified k•p model for the electronic structure of GaInNAs heterostructures. Using the tight-binding model, we first confirm that N forms a resonant defect level above the conduction band edge in Ga(In)As. We show that the interaction of the resonant N level with the conduction band edge accounts for the strong bandgap bowing observed in GaInN x As 1−x … Show more

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Cited by 148 publications
(111 citation statements)
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“…32,33 It has been argued that the conventional k·p model must be modified to include two extra spin-degenerate nitrogen states as to use ten bands to describe the electronic band structure of GaNAs/GaAs and related heterostructures. In addition, detailed studies on the nearest-neighbor environment of the substitutional N atoms in…”
Section: Band Anticrossing Modelmentioning
confidence: 99%
“…32,33 It has been argued that the conventional k·p model must be modified to include two extra spin-degenerate nitrogen states as to use ten bands to describe the electronic band structure of GaNAs/GaAs and related heterostructures. In addition, detailed studies on the nearest-neighbor environment of the substitutional N atoms in…”
Section: Band Anticrossing Modelmentioning
confidence: 99%
“…However, PL still has to be interpreted with caution, since at low temperatures it can originate from the tail of localized states at the band edge associated with any disorder in the alloy. 15 The InNAs epilayers were coherently grown to a thickness of 300 nm on InAs͑001͒ substrates by MBE using a turbopumped Vacuum Generators V80 system equipped with an Oxford Applied Research ͑OAR͒ HD25 rf plasma nitrogen source. The samples were all grown with a substrate temperature of 375°C.…”
mentioning
confidence: 99%
“…3. The change in the effective N level due to the increased concentration of N pairs with increasing x content is accounted for by E N ͑x͒ = E N0 − ␥x, 15 where E N 0 = 1.48 eV is the isolated N resonant state and ␥ = 2.00 eV. 20 The parameters for the k·p Hamiltonian were determined by fitting the resulting E ± subbands to the tight binding band structure of InN x As 1−x .…”
mentioning
confidence: 99%
“…The interaction of the extended ⌫ states of the conduction band of the host semiconductor with the localized N-induced resonant states results in the formation of two nonparabolic subbands E Ϫ and E ϩ whose dispersion is modeled using a modified k"p Hamiltonian. 4 The E Ϫ band has mainly conduction band-like character, whereas the E ϩ subband is due to the E N -like states. The parameters for the modified k"p Hamiltonian have been determined by fitting the resulting E Ϯ subbands to the tight binding band structure of InN x Sb 1Ϫx .…”
mentioning
confidence: 99%
“…Details of the tight binding calculation can be found in Ref. 4 and references therein. The dispersion of the E Ϯ subbands can be determined by finding the eigenvalues of the 2ϫ2 determinant…”
mentioning
confidence: 99%