Three-Dimensional Nanofabrication with Elastomeric Phase Masks

Abstract

This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science.

Der Einsatz von Nanoskiving zur Fertigung von Nanostrukturen für elektronische und optische Anwendungen

“…[26] Es gibt drei generelle Arten der Softlithographie: 1) Abformen (Replikatformen, [22,27,28] Solvensbasiertes Mikroformen [29] und Mikroformen in Kapillaren [30] ); 2) Drucken (Mikrokontaktdrucken, [31][32][33][34] Ladungsdrucken, [35] und Nanotransferdrucken [36] ); 3) optische Nahfeldlithographie (in zwei oder drei Dimensionen). [37][38][39] Die Schlüsselschritte all dieser Arten von Softlithographie beruhen auf physikalischem Kontakt. Die Grenzen der Genauigkeit im Zuge der Vervielfältigung mittels Softlithographie werden nicht durch die Beugung des Lichts oder die Brechung des Strahls geladener Teilchen, sondern vielmehr durch Van-der-Waals-Wechselwirkungen, die physikalische Deformierung des Stempels, die Aufnahme oder Verteilung der flüssigen Tinten sowie verwandter Prozesse bestimmt.…”

One-dimensional photonic crystals: fabrication, responsiveness and emerging applications in 3D construction

“…[10][11][12] Various kinds of lamellar structures of good mechanical performance and multi-functionality are also fabricated inspired by the natural structure of nacre. Although lots of efforts have been paid to mimic ordered three dimensional structures, [16][17][18][19][20][21][22][23][24] one dimensional layered structure also well known as one dimensional photonic crystals (1DPCs), is widely studied by scientists from basic theory to practical applications. Although lots of efforts have been paid to mimic ordered three dimensional structures, [16][17][18][19][20][21][22][23][24] one dimensional layered structure also well known as one dimensional photonic crystals (1DPCs), is widely studied by scientists from basic theory to practical applications.…”

Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

“…Most previous attempts in fabricating woodpile structures using IL yielded moderate low structure quality with low normal incidence reflectivity ͑ϳ25% -35%͒. 11,12 Fabrication methods based on phasemasks, [13][14][15][16][17][18][19][20] particularly those that use conformal masks in soft, contact mode exposure geometries, [13][14][15][16][17][18][19] avoid some of these drawbacks to provide simple routes to photonic crystals 17 and even aperiodic, spatially graded or quasicrystalline structures. 15,16 In their typical implementation, however, the structure geometries remain limited; woodpile structures, for example, cannot be fabricated easily.…”