Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

Shir, Daniel; Nelson, Erik C.; Chanda, Debashis; Brzezinski, Andrew; Rogers, John A.; Wiltzius, Pierre

doi:10.1116/1.3456181

Cited by 20 publications

(27 citation statements)

References 26 publications

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“…226 Nanophotonic structures are now typically fabricated using top-down methods. 227,228,229 The same is true of BPM. In contrast, self-assembled colloidal structures are ideal candidates for the generation of large-area, low-cost, structural-color materials 230,231,232,233 because the degree of perfection required to meet the functional specification is so much less and the ability to scale production to large areas through roll-to-roll processing is so much greater.…”

Section: Colloidal Self-assemblymentioning

confidence: 76%

Nanomanufacturing: A Perspective

2016

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Nanomanufacturing, the commercially-scalable and economically-sustainable mass production of nanoscale materials and devices, represents the tangible outcome of the nanotechnology revolution. In contrast to those used in nanofabrication for research purposes, nanomanufacturing processes must satisfy the additional constraints of cost, throughput, and time to market. Taking silicon integrated circuit manufacturing as a baseline, we consider the factors involved in matching processes with products, examining the characteristics and potential of top-down and bottom-up processes, and their combination. We also discuss how a careful assessment of the way in which function can be made to follow form can enable high-volume manufacturing of nanoscale structures with the desired useful, and exciting, properties.

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Section: Colloidal Self-assemblymentioning

confidence: 76%

Nanomanufacturing: A Perspective

2016

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“…[14][15][16][17][18][19][20][21][22][23][24][25][26][27][28] In the regime where diffraction up to the fi rst order is supported, diffraction effi ciencies responsible for generating the 3D intensity patterns are determined by the interference of two dominant guided modes propagating along the depth direction.…”

Section: Resultsmentioning

confidence: 99%

“…[ 6 ] The phenomenon of zeroth order diffraction suppression in phase gratings is closely related to the π phase shift and differs from that observed in amplitude gratings. This easy and versatile approach has invited widespread usage in a range of areas such as photonic crystals, [14][15][16][17][18][19] chiral metamaterials, [ 20 ] microfl uidics, [ 21,22 ] stretchable platforms, [ 23 ] biomedical platforms, [ 24 ] resonators, [ 25 ] optical coatings, [ 26,27 ] and thin fi lm solar cells. In amplitude gratings, the zeroth order cannot be nullifi ed.…”

mentioning

confidence: 99%

Rational Control of Diffraction and Interference from Conformal Phase Gratings: Toward High‐Resolution 3D Nanopatterning

Hyun

Park

Kim

et al. 2014

Advanced Optical Materials

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fi eld continuity needs to be maintained between the raised and recessed regions where abrupt changes in phase occur, a sharp intensity minimum is generated. [ 5 ] A simple question of practical importance is what relief height achieves the highest resolution? According to simple scalar analysis, the intensity contrasts are greatest when the relief heights generate fi elds phase shifted by π, a condition that can be easily derived by considering the index contrast between grating and surrounding medium. However, as the grating periodicity approaches the wavelength, the electric and magnetic fi elds are no longer decoupled at the boundaries of the grating, and a more rigorous treatment is necessary to predict the phase shifts. [ 6 ] The phenomenon of zeroth order diffraction suppression in phase gratings is closely related to the π phase shift and differs from that observed in amplitude gratings. The zeroth order diffraction effi ciency is a measure of the average background of transmission, and corresponds to the zeroth order Fourier component. In amplitude gratings, the zeroth order cannot be nullifi ed. However, at a fi ll factor of 50%, defi ned as when the area of the grating structure is half of that of the unit cell, a phase grating at the π phase shift condition can nullify the zeroth order because the total sum of background transmission cancels out. The nullifi ed intensity enables phase gratings to be useful as beam splitters, [ 7 ] modulators, [ 8 ] and optical coatings for solar cells. [ 9 ] Furthermore, this ability could also enable phase gratings to be used as far fi eld diffractive elements for laser interference techniques. [ 10 ] Another important application of the conformal phase grating can be found in proximity-fi eld nanopatterning (PnP) [ 11 ] or phase-shift lithography [ 12,13 ] which uses three-dimensional (3D) interference of diffracted orders from a phase mask to generate 3D periodic porous nanostructures in a single exposure step. This easy and versatile approach has invited widespread usage in a range of areas such as photonic crystals, [14][15][16][17][18][19] chiral metamaterials, [ 20 ] microfl uidics, [ 21,22 ] stretchable platforms, [ 23 ] biomedical platforms, [ 24 ] resonators, [ 25 ] optical coatings, [ 26,27 ] and thin fi lm solar cells. [ 28 ] The intensity distribution originates from the self-imaging effect, or Talbot effect [ 29 ] whose spatial characteristics depend strongly on the periodicity of the grating and exposure wavelength. One important aspect of the 3D interference phenomenon that has not yet been reported, to our knowledge, is the control of contrast The effective control of the zeroth order diffraction effi ciency in phase gratings is a key technique that enables implementation of high-performance optical elements. An interesting and unexplored application is in the fi eld of phase mask interference lithography, which uses a conformal grating to generate periodic 3D nanopatterns by the optically formed Talbot image. A good understanding of the infl uence of...

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“…The occurrence of a stop gap was confirmed by means of optical reflectivity and transmission measurements. Two-photon polymerization was used to obtain a template for a silicon inverse woodpile [105]. Inversion of the polymer template is achieved through a sequence of conformal coating of a layer of Al 2 O 3 , chemical vapor deposition of silicon, and removal of both Al 2 O 3 and template.…”

Section: Inverse Woodpilesmentioning

confidence: 99%

Cavity quantum electrodynamics with three-dimensional photonic band gap crystals

Vos

Woldering²

2014

Light Localisation and Lasing

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Three-dimensional (3D) photonic crystals with a 3D photonic bandgap play a fundamental role in cavity quantum electrodynamics (QED), especially in phenomena where the local density of optical states is essential. We first review the current status of the fabrication of 3D photonic crystals with a bandgap at optical frequencies, corresponding to wavelengths below 2500 nm. We discuss the main implications of 3D bandgaps for cavity QED, in particular spontaneous emission inhibition of emitters embedded in a 3D bandgap crystal. Moreover, we review progress in enhanced emission of emitters placed in a photonic bandgap cavity, thresholdless laser action in a miniature photonic crystal cavity, breaking of the weak-couping limit of cavity QED. Finally, we discuss several exciting applications of 3D photonic band gap crystals, namely the shielding of decoherence for quantum information science, the manipulation of multiple coupled emitters including resonant energy transfer, lighting, and possible spin-off to 3D nanofabrication for future high-end computing.

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Dual exposure, two-photon, conformal phase mask lithography for three dimensional silicon inverse woodpile photonic crystals

Cited by 20 publications

References 26 publications

Nanomanufacturing: A Perspective

Nanomanufacturing: A Perspective

Rational Control of Diffraction and Interference from Conformal Phase Gratings: Toward High‐Resolution 3D Nanopatterning

Cavity quantum electrodynamics with three-dimensional photonic band gap crystals

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