Thin oxide nitridation in N2O by RTP for non-volatile memories

Extension of the Deal-Grove oxidation model to include the effects of nitrogen

“…A number of experimental results on the growth kinetics for oxidation in N20 have appeared in the literature [ 171- [21]. These results involve different oxidation times (from few seconds to 120 m ), different oxidation temperatures (from 885°C to 12OO0C), different pressures of the oxidizing gas (1 atm and 500 torr), and different initial oxide thicknesses (up to 15 nm).…”

“…The first term in (21) is identical to the first, so-called linear rate term of (1 1). The only difference is in the second, so-called initial rate term, in that e-r/xa used in TMA SUPREM-3 appears as in (21). At first glance there appears to be no advantage in using the term e&/' instead of the term as the longer oxidation time t corresponds to a larger oxide thickness 2 .…”