“…Nowadays, however, the higher performance of TFTs is required for the flat panel displays, especially for AM-OLEDs; consequently, polycrystalline Si (poly-Si) crystallized at low temperatures have been attracting great attention because of their superior characteristics, such as fast carrier mobility and low driving voltage [3,4]. Various low-temperature crystallization techniques of a-Si deposited on glass substrates have been intensively studied, and among the low-temperature crystallization techniques, excimer laser crystallization (ELC) and solid phase crystallization (SPC) have been widely reported [4,5]. Even though excimer laser is an optimized energy source to crystallize a-Si, ELC method has the problems of the laser shot mark, shot stability, and higher process cost.…”