2016
DOI: 10.1016/j.tsf.2016.03.056
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Thin film of guest-free type-II silicon clathrate on Si(111) wafer

Abstract: Thin films of guest-free type-II Si clathrate (Si136) were fabricated on Si(111) wafers in two steps: NaxSi136 thin-film formation by thermal decomposition of NaSi precursor films and Na removal from the NaxSi136 film by a heat treatment with iodine. Cross-sectional TEM observation and XRD and Raman measurements verified the formation of 1-µm-thick Si136 films on the Si wafer. Since the prepared films showed n-type conduction, pn junction devices were developed by a Si136/p-type Si structure. This device showe… Show more

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Cited by 27 publications
(32 citation statements)
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References 30 publications
(48 reference statements)
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“…It should be noted here that the present films included type I Si clathrate even without BN receptacle, in disagreement with our previous work [16]. In the previous work, type II Si clathrates only have been generated on Si (111) substrate when the thicknesses were…”
Section: Samples Synthesized With Modified Vacuum Annealing Conditioncontrasting
confidence: 99%
“…It should be noted here that the present films included type I Si clathrate even without BN receptacle, in disagreement with our previous work [16]. In the previous work, type II Si clathrates only have been generated on Si (111) substrate when the thicknesses were…”
Section: Samples Synthesized With Modified Vacuum Annealing Conditioncontrasting
confidence: 99%
“…The type-II Si clathrate thin films (Na x Si 136 ) were obtained by this second annealing. The Na content (x) in the Na x Si 136 films prepared under the same conditions was estimated to be about 10 [16]. In order to remove the Na atoms, an additional I 2 -treatment was necessary and it was carried out according to the following process.…”
Section: Methodsmentioning
confidence: 99%
“…Recently, we have synthesized type-I and type-II Si clathrate thin films (Na 8 Si 46 and Na x Si 136 ) on single-crystalline Si substrates [14][15][16]. The Si clathrate films were obtained from a well-controlled thermal annealing of the NaSi films under vacuum.…”
Section: Introductionmentioning
confidence: 99%
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“…The main challenge for obtaining a guest-free clathrate Si46, whether in type-I or VIII phases, is the fact that removing the guest atoms from the cages will induce a collapse of the system and hence a phase transformation towards more stable phases such as diamond structure Si2 [10,37]. Nevertheless, guest-free type-II Si136 clathrate, was the only guest-free silicon clathrate to be successfully synthesized as crystalline [13], or thin film forms [15].…”
Section: Iii2b Under Pressurementioning
confidence: 99%