1997 IEEE MTT-S International Microwave Symposium Digest
DOI: 10.1109/mwsym.1997.602823
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Thin-film microstrip lines for MM and sub-MM/wave on-chip interconnects

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Cited by 24 publications
(21 citation statements)
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“…20(b). The 150-µm HR silicon is used as handling wafer and the BCB 4026-57 (ε r = 2.65, and tanδ = 0.015 [38]) is used for a thin-film substrate. The coupling structure includes three metal layers and two dielectric layers.…”
Section: Experimental Demonstration a Fabricationmentioning
confidence: 99%
“…20(b). The 150-µm HR silicon is used as handling wafer and the BCB 4026-57 (ε r = 2.65, and tanδ = 0.015 [38]) is used for a thin-film substrate. The coupling structure includes three metal layers and two dielectric layers.…”
Section: Experimental Demonstration a Fabricationmentioning
confidence: 99%
“…Manuscript received September 3, 1997; revised February 12, 1998 Materials typically used for dielectric layers and passivation in MMIC's include silicon oxides and nitrides, as well as organic compounds like polyimide and benzocylobutene (BCB) [4]. The dielectric layer thickness typically ranges from 0.2 m Si N passivation) to several micrometers SiO , polyimide), as does the metallization thickness.…”
Section: Onolithic Microwave Integrated Circuits (Mmic's)mentioning
confidence: 99%
“…[12], [13], metallic waveguide [14]- [18], and dielectric waveguide [19], [20]. The dielectric waveguides with low loss dielectric material have much less losses than transmission lines and metallic waveguides since the conduction loss is avoided.…”
Section: Introductionmentioning
confidence: 99%