Thickness uniformity and surface morphology of Fe, Ti, and Hf films produced by filtered pulsed cathodic arc deposition

Li, L.H.; Lu, Qishao; Fu, Ricky K.Y.; Chu, Paul K.

doi:10.1016/j.surfcoat.2008.08.026

Cited by 4 publications

(2 citation statements)

References 14 publications

(14 reference statements)

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“…For example, the typically used optical methods are only suitable for transparent or translucent films [13], while the stylus methods (viz. AFM or profilometer) can only give the surface topography of the films [14]. And the electrons method cannot give accurate measuring results which is limited by the statistical fluctuation of the beam intensity [15].…”

Section: Introductionmentioning

confidence: 99%

Investigation of thickness uniformity of thin metal films by using α-particle energy loss method and successive scanning measurements

Bai

2017

J. Inst.

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The metal films are widely used in the Inertial Confinement Fusion (ICF) experiments to obtain the radiation opacity, and the accuracy of the measuring results mainly depends on the accuracy of the film thickness and thickness uniformity. The traditional used measuring methods all have various disadvantages, the optical method and stylus method cannot provide mass thickness which reflects the internal density distribution of the films, and the weighing method cannot provide the uniformity of the thickness distribution. This paper describes a new method which combines the α-particle energy loss (AEL) method and the successive scanning measurements to obtain the film thickness and thickness uniformity. The measuring system was partly installed in the vacuum chamber, and the relationship of chamber pressure and energy loss caused by the residual air in the vacuum chamber was studied for the source-to-detector distance ranging from 1 to 5 cm. The results show that the chamber pressure should be less than 10 Pa for the present measuring system. In the process of measurement, the energy spectrum of α-particles transmitted through each different measuring point were obtained, and then recorded automatically by a self-developed multi-channel analysis software. At the same time, the central channel numbers of the spectrum (CH) were also saved in a text form document. In order to realize the automation of data processing and represent the thickness uniformity visually in a graphic 3D plot, a software package was developed to convert the CH values into film thickness and thickness uniformity. The results obtained in this paper make the film thickness uniformity measurements more accurate and efficient in the ICF experiments. K: Analysis and statistical methods; Data processing methods; Spectrometers 1Corresponding author.

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Section: Introductionmentioning

confidence: 99%

Investigation of thickness uniformity of thin metal films by using α-particle energy loss method and successive scanning measurements

Bai

2017

J. Inst.

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“…Sheet resistance uniformity of thin films deposited on TCO substrates is one of the key successful parameters of the film quality. Previous studies examined ways of achieving a high uniformity of deposit using a range of different deposition techniques, such as pulse laser deposition [ 3 ], chemical beam coating [ 4 ], vacuum arc deposition [ 5 ], and plasma enhanced chemical vapor deposition. In addition, some studies also simulated the uniformity models of the deposit through a Monte Carlo simulation [ 6 , 7 ].…”

Section: Introductionmentioning

confidence: 99%

Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films

2012

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An alternative indium-free material for transparent conducting oxides of fluorine-doped tin oxide [FTO] thin films deposited on polyethylene terephthalate [PET] was prepared by electron cyclotron resonance - metal organic chemical vapor deposition [ECR-MOCVD]. One of the essential issues regarding metal oxide film deposition is the sheet resistance uniformity of the film. Variations in process parameters, in this case, working and bubbler pressures of ECR-MOCVD, can lead to a change in resistance uniformity. Both the optical transmittance and electrical resistance uniformity of FTO film-coated PET were investigated. The result shows that sheet resistance uniformity and the transmittance of the film are affected significantly by the changes in bubbler pressure but are less influenced by the working pressure of the ECR-MOCVD system.

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Non-colloidal Nanocatalysts Fabricated with Nanolithography and Arc Plasma Deposition

Kim

Park

2013

Current Trends of Surface Science and Catalysis

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Thickness uniformity and surface morphology of Fe, Ti, and Hf films produced by filtered pulsed cathodic arc deposition

Cited by 4 publications

References 14 publications

Investigation of thickness uniformity of thin metal films by using α-particle energy loss method and successive scanning measurements

Investigation of thickness uniformity of thin metal films by using α-particle energy loss method and successive scanning measurements

Effects of process parameters on sheet resistance uniformity of fluorine-doped tin oxide thin films

Non-colloidal Nanocatalysts Fabricated with Nanolithography and Arc Plasma Deposition

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