1995
DOI: 10.1016/0038-1101(95)00050-4
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Thermal stabilization of power HBTs using n-AlxGa1−xAs emitter ballast resistors with high thermal coefficient of resistance

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Cited by 14 publications
(2 citation statements)
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“…The used GaAs n ‡ emitter layer has a value of around 10 ¡3 K ¡1 , which may be improved to 8 £ 10 ¡3 K ¡1 if the Al 0:3 Ga 0:7 As emitter layer only in the structure could be used (Twynam et al 1995) .…”
Section: Discussionmentioning
confidence: 99%
“…The used GaAs n ‡ emitter layer has a value of around 10 ¡3 K ¡1 , which may be improved to 8 £ 10 ¡3 K ¡1 if the Al 0:3 Ga 0:7 As emitter layer only in the structure could be used (Twynam et al 1995) .…”
Section: Discussionmentioning
confidence: 99%
“…A thick, highly doped base layer is used to give low TED resistance (base transit time is relatively unimportant in this device). The AlGaAs ballast layer has a 35% Al mole fraction and high doping density to give good current uniformity within the emitter finger without current saturation [6].…”
mentioning
confidence: 99%