“…Secondly, output power increase is not only due to the increase in device size, but also due to a graphene layer which produces RTD-gated-graphene-2DEF and the negative differential resistance (NDR). According to references [14,16,17], two-dimensional electron fluid (2DEF) is required to realize power amplification, which is produced by RTD-gated HEMT with very complicated layered structure. Because the films thickness of the RTD-gated HEMT are very small, only a few nanometers, so the molecular beam epitaxy [19,22,23] or metal-organic chemical vapor deposition [24] is required [25].…”