1988
DOI: 10.1016/0038-1101(88)90353-x
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The use of linearly graded composition AlGaAs injectors for intervalley transfer in GaAs: theory and experiment

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Cited by 29 publications
(9 citation statements)
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“…1 (for more detail see Refs. [9] and [10]). Each device consists of a graded Al x Ga 1-x As barrier region, grown to have nominal thickness D ≈ 50 nm, with composition x varying from 0 to 0.3; this layer is bounded by two GaAs layers, as shown in Fig.…”
Section: Introductionmentioning
confidence: 95%
“…1 (for more detail see Refs. [9] and [10]). Each device consists of a graded Al x Ga 1-x As barrier region, grown to have nominal thickness D ≈ 50 nm, with composition x varying from 0 to 0.3; this layer is bounded by two GaAs layers, as shown in Fig.…”
Section: Introductionmentioning
confidence: 95%
“…The means proved to be successful with TED based on GaAs or InP turned out to be inefficient for semiconductor nitrides [8]. One of the weakly-studied directions in the area of TED creation is the use of gradedgap semiconductor compounds that can overcome the need of heating to some extent for the electron gas at the cathode [12][13][14][15]. So, there is a need to study the microwave generation of TED based on graded-gap semiconductor nitrides, in particular, AlInN, by numerical simulations aimed at determining prospects and possibilities of practical realization of these devices.…”
Section: Introductionmentioning
confidence: 99%
“…Для устранения негативного влияния некоторых из названных причин в настоящее время, в основном, используют планарные технологии [7,8] и варизонный катодный контакт. В работах [9][10][11][12][13][14][15][16] показано, что ДГ на основе варизонных полупроводников имеют более высокие значения эффективности генерации (КПД) и выходной мощности. Основной причиной такого повышения является локальное понижение энергетического зазора между неэквивалентными долинами в варизонном полупроводнике в области катодного контакта [12].…”
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“…Такую возможность дают, например, AlGaAs, AlGaInAs и InGaPAs. Однако в ДГ на основе Al x Ga 1-x As-GaAs при оптимальном содержании AlAs в катоде 15…25 % [9,10,14], возможно, не достигнуто оптимальное верхнее значение энергетического зазора между долинами, так как оно ограничено сверху значением для GaAs. С другой стороны, по целому ряду электрофизических свойств InGaAs более предпочтителен, чем GaAs [8].…”
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