The phase-shifting mask II: Imaging simulations and submicrometer resist exposures

Levenson, M. D.; Goodman, Douglas S.; Lindsey, S.; Bayer, P.; Santini, H.A.E.

doi:10.1109/t-ed.1984.21603

Cited by 49 publications

(14 citation statements)

References 2 publications

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“…The original publication and many subsequent studies (e.g. [84]) focus on the application of this method for projection lithography, but already in this work the potential for resolution enhancement in proximity lithography was emphasized. In contrast to projection lithography, for which the phase-shifting method was explored in-depth [85], it was not realized for generalized geometries in proximity lithography for over 30 years.…”

Section: Early Attempts For Resolution Enhancementmentioning

confidence: 99%

High-resolution proximity lithography for nano-optical components

Stuerzebecher

Fuchs

Zeitner

et al. 2015

Microelectronic Engineering

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Section: Early Attempts For Resolution Enhancementmentioning

confidence: 99%

High-resolution proximity lithography for nano-optical components

Stuerzebecher

Fuchs

Zeitner

et al. 2015

Microelectronic Engineering

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“…After phase-shifting masks were first introduced [12], modeling has proven to be indispensable in their study. Levenson used modeling extensively to understand the effects of phase masks [13]. One of the earliest studies of phaseshifting masks used modeling to calculate images for Levenson's original alternating phase mask, then showed how phase masks increased defect printability [14].…”

Section: A Research Toolmentioning

confidence: 99%

Thirty years of lithography simulation

Mack

2005

Optical Microlithography XVIII

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Thirty years ago Rick Dill and his team at IBM published the first account of lithography simulation -the accurate description of semiconductor optical lithography by mathematical equations. Since then, lithography simulation has grown dramatically in importance in four important areas: as a research tool, as a development tool, as a manufacturing tool, and as a learning tool. In this paper, the history of lithography simulations is traced from its roots to today's indispensable tools for lithographic technology development. Along the way, an attempt will be made to define the true value of lithography simulation to the semiconductor industry.

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“…Levenson used modeling extensively to understand the effects of phase masks [20]. One of the earliest studies of phase-shifting masks used modeling to calculate images for Levenson's original alternating phase mask, then showed how phase masks increased defect printability [21].…”

Section: Research Toolmentioning

confidence: 99%

<title>Lithographic simulation: a review</title>

Mack

2001

SPIE Proceedings

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A review of the current state of the art in optical and electron beam lithography simulation is presented. Basic physical models are described and examples are given. In addition, rigorous electromagnetic simulation for mask topography is shown and the use of statistical modeling to predict feature size distributions in manufacturing is described. Finally, numerous examples of the use of lithography simulation and its impact on the semiconductor industry are offered.

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The phase-shifting mask II: Imaging simulations and submicrometer resist exposures

Cited by 49 publications

References 2 publications

High-resolution proximity lithography for nano-optical components

High-resolution proximity lithography for nano-optical components

Thirty years of lithography simulation

<title>Lithographic simulation: a review</title>

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