2019
DOI: 10.1016/j.seppur.2019.03.050
|View full text |Cite
|
Sign up to set email alerts
|

The influence of surface treatment and activation of thin film composite membranes with plasma discharge and determination of their physicochemical properties

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1

Citation Types

0
2
0

Year Published

2020
2020
2022
2022

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 10 publications
(2 citation statements)
references
References 48 publications
0
2
0
Order By: Relevance
“…The plasma treatment improved the wettability of the surface, reducing the contact angle with water for both materials, around 50% for PVDF and 65% for PES right after exposure to plasma (Figure 2, d0). Studies reporting the use of DC corona plasma treatment on the surface of composite reverse osmosis, 31 PES, 32 and PAN 30 membranes showed a decrease of 80, 99 and 86%, respectively, of the water contact angles just after plasma treatment, resulting in an improvement in the hydrophilicity of the membranes surface.…”
Section: Chemical and Physical Characteristics Of The Membranesmentioning
confidence: 98%
“…The plasma treatment improved the wettability of the surface, reducing the contact angle with water for both materials, around 50% for PVDF and 65% for PES right after exposure to plasma (Figure 2, d0). Studies reporting the use of DC corona plasma treatment on the surface of composite reverse osmosis, 31 PES, 32 and PAN 30 membranes showed a decrease of 80, 99 and 86%, respectively, of the water contact angles just after plasma treatment, resulting in an improvement in the hydrophilicity of the membranes surface.…”
Section: Chemical and Physical Characteristics Of The Membranesmentioning
confidence: 98%
“…To generate the plasma, there is a gas discharge that can be carried out by direct current, alternating current as radio-frequency or microwave. These plasma sources have many applications used in deposition of thin and thick films, materials treatment including surface modifications, light sources, semiconductor processing and treatment of waste [3][4][5][6][7][8][9][10]. The plasma can be classified into low and high temperature, where the low temperature, cold plasma, is divided into two types that are low and atmospheric pressures [11][12][13][14].…”
Section: Introductionmentioning
confidence: 99%