The impact of projection lens polarization properties on lithographic process at hyper-NA

Abstract

The continuous implementation of novel technological advances in optical lithography is pushing the technology to ever smaller feature sizes. For instance, it is now well recognized that the 45nm node will be executed using state-of-the-art ArF (193nm) hyper-NA immersion-lithography. Nevertheless, a substantial effort will be necessary to make imaging enhancement techniques like hyper-NA immersion technology, polarized illumination or sophisticated illumination modes routinely available for production environments.In order to support these trends, more stringent demands need to be placed on the lithographic optics. Although this holds for both the illumination unit and the projection lens, this paper will focus on the latter module. Today, projection lens aberrations are well controlled and their lithographic impact is understood. With the advent of imaging enhancement techniques such as hyper-NA immersion lithography and the implementation of polarized illumination, a clear description and control of the state of polarization throughout the complete optical system is required.Before polarization was used to enhance imaging, the imaging properties at each field position of the lens could be fully characterized by 2 pupil maps: a phase map and a transmission map. For polarized imaging, these two maps are replaced by a 2x2 complex Jones matrix for each point in the pupil. Although such a pupil of Jones matrices (short: Jones pupil) allows for a full and accurate description of the physical imaging, it seems to lack transparency towards direct visualization and lithographic imaging relevance.In this paper we will present a comprehensive method to decompose the Jones pupils into quantities that represent a clear physical interpretation and we will study the relevance of these quantities for the imaging properties of lithography lenses.

Polarization aberration control for ArF projection lenses

“…For an actual optical system, however, due to its complexity it is very difficult to find the optimal solution using polarization ray tracing. Although there are reported studies on the relation between total polarization characteristics of an optical system and its imaging characteristics 1,2,5,6 , there seems to be no theory that effectively solves an inverse problem for the polarization characteristics of an optical system. The new approximation approach presented here is practically applicable to an optical system not including actively-modulating polarization elements such as PBS and wavelength plate.…”

Impact of mask pellicle effects to OPC quality

“…An approximate method to describe these polarization dependent image distortions has been proposed recently [7]. This approximation allows to reduce the number of parameters from 8 down to 5.…”

Tolerance analysis of non-depolarizing double-pass polarimetry

“…Though the true reflectance amplitude of the hemispherical mirror is not unity, only the difference between the reflectance in the X and Y directions affects the diattenuation and retardance of the pupil. This is because the measured Jones pupil matrix J measure is further decomposed into a product of apodization, a partial polarizer, a retarder and two other physically meaningful matrices [5], and only the diattenuation pupil in the partial polarizer and the retardance pupil in the retarder will be further expanded by the OZP. Writing the reflectance in theAQKindly check all equations presentation and citation if presented correctly.…”

“…Polarimeters characterize the polarization properties of materials. They find application in, for instance, optical samples [2], cancer non-invasive screening tools [3] in clinics, hyper-numerical-aperture lithography [4][5][6][7][8] where controlled polarization enhances the contrast and thus enabling smaller structures to be written on the wafer.…”