The Fabrication of Thin, Freestanding, Single‐Crystal, Semiconductor Membranes

Abstract

Freestanding, single-crystal, semiconductor membranes with thicknesses in the range of a few tens of nanometers to tens of microns are of increasing technological interest today. Their applications range from high speed electronic devices to electromechanical devices and pressure sensors. This review paper identifies two general classes of techniques for producing such thin membranes: dissolution of single-crystal wafers, and direct growth of single-crystal membranes. Numerous specific techniques in each general class are discussed. The discussion of each technique includes a brief explanation of the reason why it works, a description of the actual experimental implementation, an analysis of the range of thickness that can be produced, and the crystalline and electrical quality of the membranes. Unusual difficulties with implementing a technique, or special advantages of a technique are also noted. Since this review is intended to aid in the selection of a technique for producing thin semiconductor membranes when one has a particular application in mind, note is made of those applications for which the membranes produced with each technique are particularly well suited. ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 128.197.26.12 Downloaded on 2015-06-27 to IP ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 128.197.26.12 Downloaded on 2015-06-27 to IP

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