“…Usually, fabrication of nanofluidic devices involves two key steps, preparation of nanostructures on a substrate and sealing of the nanostructure on the substrate with a cover sheet. As to the fabrication of nanochannels, many dry etching techniques, such as reactive ion etching (Mao and Han 2005), electrobeam lithography (Yasin et al 2001), focused-ion beam lithography (Cannon et al 2004), proton beam writing (Mahabadi et al 2006), interferometric lithography (O'Brien et al 2003), and scanning probe lithography (Ginger et al 2004), have been reported to produce the nanostructures on various substrates. These techniques enable precise fabrication of 1-D, 2-D, and even 3-D nanostructures.…”