The etching process of boron nitride by alkali and alkaline earth fluorides under high pressure and high temperature

Characterization of boron nitride phase transformations in the Li–B–N system under high pressure and high temperature

“…S2a). This is consistent with the results of the previous works on BN transformation [14][15][16]. Furthermore, many pits appear in the samples after treated by hydrochloric, molten hydroxides and sulfuric acid (Figs.…”

Strong confinement of optical fields using localized surface phonon polaritons in cubic boron nitride

“…Possible explanations for etching variability may be that the surface of the cBN crystals was initially not uniformly smooth, or that it was covered by an uneven density of adsorbents. Similar tetrahedral shape particles have also been obtained by Guo et al (2014) on cBN surface having introduced in the mixture CaF2 and MgF2 [22]. They found that the relative growth rate of tetrahedral particles depends on the etchant and the exposed crystal facet.…”

“…Our method, which relies only on reactive ion etching (RIE) is highly scalable, accessible, and relatively inexpensive, in comparison to e-beam lithography. We show that the aperiodic the SPhP resonances still exhibit linewidths of 32 cm -1 , offering a Q-factor of 38, higher than the best pure plasmonic resonators [21]. Here Q is defined as the ratio of the resonant frequency to the full-width half-maximum of the resonance intensity spectrum (w/Dw).…”

“…We show that the aperiodic nanostructures support highly absorptive, localized SPhP resonances suitable for SEIRA and tailored thermal emitters. Despite the random orientation and large variations in nanoparticle sizes via this lithography-free method, the SPhP resonances still exhibit linewidths of 32 cm -1 , offering a Q-factor of 38, higher than the best pure plasmonic resonators [21]. Here Q is defined as the ratio of the resonant frequency to the full-width half-maximum of the resonance intensity spectrum (w/Dw).…”