The electrical and optical properties of molybdenum-doped indium oxide films grown at room temperature from metallic target

Abstract

High performance molybdenum-doped indium oxide (IMO) films were deposited on slide glass substrates from metallic targets by using dc reactive magnetron sputtering at room temperature. The structural, electrical and optical properties have been investigated as functions of target composition and oxygen partial pressure. The deposited films were smooth and amorphous, as determined by scanning electron microscopy and x-ray diffraction, respectively. The results revealed that the as-deposited molybdenum-doped In 2 O 3 films show good electrical property and high optical transmittance, as well as high infrared transmittance. The films prepared at oxygen partial pressure of 3.8 × 10 −2 Pa and with 2 wt% Mo-doped target are characteristic of high Hall mobility of 20.2 cm 2 V −1 s −1 , carrier concentration of 5.2 × 10 20 cm −3 , and the average optical transmittance excess 90% in the visible region from 400 to 700 nm. Thus IMO films may be a potential material for novel optoelectrical devices such as an organic light-emitting diode.

Amorphous tungsten-doped In2O3 transparent conductive films deposited at room temperature from metallic target

“…1, which only exhibits a halo peak, indicating that as-deposited IWO films are amorphous. This result is similar to that of IMO films [12] and agrees with the crystalline temperature of roughly up to 150°C for In 2 O 3 -based transparent conductive thin films in similar processes. For comparison, typical polycrystalline IWO thin films prepared at 320°C in our previous work [10] is also shown in Fig.…”

Electrical and optical properties of In2O3:Mo thin films prepared at various Mo-doping levels

“…% with TC = 16 × 10 −3 −1 . The observed figure of merit investigated is better than magnetron sputtered Mo-doped In 2 O 3 films [36].…”

Tungsten-doped In2O3 transparent conductive films with high transmittance in near-infrared region

“…The amorphous molybdenum-doped In 2 O 3 (IMO) films with high-NIR transparency were prepared by dc reactive magnetron sputtering in our previous study [11]. In this study, tungstendoped indium oxide (IWO) thin films were fabricated.…”