The effect of hydrogen evolution on the mechanical properties of hydrogenated amorphous carbon

Benlahsen, M.; Branger, V.; Henocque, J.; Badawi, F.; Zellama, K.

doi:10.1016/s0925-9635(97)00300-2

Cited by 16 publications

(2 citation statements)

References 17 publications

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“…In addition, absolute values of the tensile stress were similar to the ones obtained in our study (0.2-0.4 GPa). Tensile stress similarly to our results was reported for the bias assisted DC plasma DLC coatings [37] as well. Therefore, decrease of the tensile internal stress with the increased nitrogen doping can be explained by increased amount of a non-diamond phase [7], that is beneficial to the relaxation of intrinsic tensile stress [23] and by appearance of the compressive stress due to non-diamond carbon impurities at the grain boundaries [22].…”

Section: Mechanical Properties Of the Ion Beam Deposited Carbon Filmssupporting

confidence: 91%

Deposition of carbon films by direct ion beam

Meškinis¹,

Tamulevičius²,

Kopustinskas³

2004

Lith. J. Phys.

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In this study diamond-like carbon (DLC) films have been grown onto the Si(111) and steel substrates by direct hydrocarbon (hexane, acetylene) ion beam deposition. Raman spectra of the room temperature deposited carbon films were typical of the hard tetrahedral amorphous carbon films. At 500 and 750 K temperatures, polymer-like carbon films have been synthesized. Hydrocarbon gas dilution by nitrogen resulted in growth of the more graphitic films. Increase of the deposition temperature resulted in increased internal stress in carbon films deposited from hexane-hydrogen gas mixture. Thin film stress decreased as a result of the hexane-hydrogen mixture dilution by nitrogen. Stress decreased with increase of the nitrogen concentration. It has been revealed that DLC films can be deposited by direct ion beam onto the AISI 316 steel at room temperature. Ion beam nitridation was the best method for increase of adhesion between the DLC and steel substrate.

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Section: Mechanical Properties Of the Ion Beam Deposited Carbon Filmssupporting

confidence: 91%

Deposition of carbon films by direct ion beam

Meškinis¹,

Tamulevičius²,

Kopustinskas³

2004

Lith. J. Phys.

View full text Add to dashboard Cite

show abstract

“…Such a microstructure, which plays a crucial role in the observed properties, is found to be deeply dependent on the techniques and conditions of depositions [10]. Among the various deposition techniques, room temperature radio frequency (RF) magnetron sputtering is a very efficient technique for the production of amorphous carbon films, since depending on the deposition conditions, the film properties may vary from soft-polymer-like (high hydrogen content and high sp 3 proportion) and graphitic (low hydrogen content and high sp 2 proportion) forms to hard diamond-like a-C:H which has mixed bonding, a low hydrogen content and a large degree of cross linking and structural rigidity [11][12][13][14]. Usually, the dominant high-field conduction mechanism that is taking place in amorphous carbon thin films is based on the Poole-Frenkel effect [15][16][17].…”

Section: Introductionmentioning

confidence: 99%