The effect of an atmospheric pressure plasma treated MgO layer on the discharge performance of an AC plasma display panel

Nam, Kee‐Seok; Lee, H.J.; Lee, S.H.; Lee, G.H.; Song, Yo-Seung; Lee, D.Y.

doi:10.1016/j.surfcoat.2006.04.065

Cited by 9 publications

(4 citation statements)

References 10 publications

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“…In addition, electrical conductivities of ZnO thin films can be enhanced by suitable doping of various metals (Al, Sn, Fe, Cu and etc.) for various electrical and optical applications including transparent conducting oxide electrodes for flat panel displays such as liquid crystal display, plasma displays and organic lightemitting devices [14][15][16][17].…”

Section: Introductionmentioning

confidence: 99%

Characterization of electrospun aluminum-doped zinc oxide nanofibers

Lee

Cho

et al. 2008

Thin Solid Films

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Section: Introductionmentioning

confidence: 99%

Characterization of electrospun aluminum-doped zinc oxide nanofibers

Lee

Cho

et al. 2008

Thin Solid Films

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“…In general, the atmospheric-pressure plasma technique has been used to clean and remove organic residues in semiconductor and liquid crystal display (LCD) processes. [17][18][19][20] Also, it is applied to many research studies on biotechnology [21][22][23][24][25] and has been widely employed to enhance the adhesion of polymer films on a mobile phone exterior. Moreover, the use of atmosphericpressure plasma has been considered in an R2R process 26) for flexible display manufacturing.…”

Section: Introductionmentioning

confidence: 99%

Patterning of graphene for flexible electronics with remote atmospheric-pressure plasma using dielectric barrier

Kim

Park

Han

2016

Jpn. J. Appl. Phys.

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We show results of the patterning of graphene layers on poly(ethylene terephthalate) (PET) films through remote atmospheric-pressure dielectric barrier discharge plasma. The size of plasma discharge electrodes was adjusted for large-area and role-to-role-type substrates. Optical emission spectroscopy (OES) was used to analyze the characteristics of charge species in atmospheric-pressure plasma. The OES emission intensity of the O2* peaks (248.8 and 259.3 nm) shows the highest value at the ratio of due to the highest plasma discharge. The PET surface roughness and hydrophilic behavior were controlled with CDA flow rate during the process. Although the atmospheric-pressure plasma treatment of the PET film led to an increase in the FT-IR intensity of C–O bonding at 1240 cm−1, the peak intensity at 1710 cm−1 (C=O bonding) decreased. The patterning of graphene layers was confirmed by scanning electron microscopy and Raman spectroscopy.

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“…Magnesium oxide (MgO) has attracted the attention of many researchers for application to semiconductors (Bian et al, 2004;Henyk et al, 2005;Nam et al, 2006;Tamboli et al, 2009;Nakano et al, 2004). MgO shows an excellent antisputtering property, a high secondary electron emission coefficient, and visible light permeability.…”

Section: Introductionmentioning

confidence: 99%

Epitaxial Growth of Magnesia Films on Single Crystalline Magnesia Substrates by Atmospheric-Pressure Chemical Vapor Deposition

Komatsu¹,

Alonso²,

Kobayashi³

et al. 2016

JMSR

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MgO films were epitaxially grown on single crystal MgO substrates by atmospheric-pressure chemical vapor deposition (CVD). Reciprocal lattice mappings and X-ray reflection pole figures were used to evaluate the crystal quality of the synthesized films and their epitaxial relation to their respective substrates. The X-ray diffraction profiles indicated that the substrates were oriented out-of-plane during MgO crystal growth. Subsequent pole figure measurements showed how all the MgO films retained the substrate in-plane orientations by expressing the same pole arrangements. The reciprocal lattice mappings indicated that the whisker film showed a relatively strong streak while the continuous film showed a weak one. Hence, highly crystalline epitaxial MgO thin films were synthesized on single crystal MgO substrates by atmospheric-pressure CVD.

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The effect of an atmospheric pressure plasma treated MgO layer on the discharge performance of an AC plasma display panel

Cited by 9 publications

References 10 publications

Characterization of electrospun aluminum-doped zinc oxide nanofibers

Characterization of electrospun aluminum-doped zinc oxide nanofibers

Patterning of graphene for flexible electronics with remote atmospheric-pressure plasma using dielectric barrier

Epitaxial Growth of Magnesia Films on Single Crystalline Magnesia Substrates by Atmospheric-Pressure Chemical Vapor Deposition

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