1994
DOI: 10.1088/0953-8984/6/37/005
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The diffusion of Cl into CdTe

Abstract: Results on the diffusion of Cl into CdTe are described. Diffusion anneals were carried out at selected temperatures in the range between 200 degrees C and 700 degrees C in evacuated SiO2 ampoules using a diffusion source of CdCl2 under saturated vapour pressure conditions. The concentration profiles were measured using a radiotracer sectioning technique. The profiles were found to be composed of four parts, to which a computer package consisting of the sum of four complementary error functions (erfc) gave sati… Show more

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Cited by 16 publications
(22 citation statements)
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“…2 . It was assumed that such a profile was due to chlorine and the result is in good agreement with data reported by Jones et al 7 for the diffusion of chlorine in CdTe.…”
Section: Annealing Cdte Slices Under Excess CD or Te Vapoursupporting
confidence: 88%
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“…2 . It was assumed that such a profile was due to chlorine and the result is in good agreement with data reported by Jones et al 7 for the diffusion of chlorine in CdTe.…”
Section: Annealing Cdte Slices Under Excess CD or Te Vapoursupporting
confidence: 88%
“…3 The projected room temperature diffusivity for the fastest part of the chlorine diffusion profiles (6 × 10 −25 cm 2 s −1 ) 7 was much lower than the corresponding one for iodine. 4 More recently, the diffusion of bromine into CdTe has been studied 8 and the concentration profiles which were measured using SIMS gave four-component profiles, yielding values of diffusivities and activation energies similar to those for the diffusion of iodine into CdTe.…”
Section: Introductionmentioning
confidence: 87%
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“…dislocations or subgrain boundaries) [13] or chemical disequilibrium. The occurrence of four component profiles, which have been observed for the diffusion of iodine and chlorine into CdTe [4,5,6,14] together with high surface concentrations of up to 1023 cm -3 is a rather unique feature, as no similar observations have been reported previously and are probably as much a consequence of the high-resolution sectioning technique used in this work as they are a feature of the system under investigation. An attempt is made in the following paragraphs to propose a model to explain such profiles using the information reported here.…”
Section: Discussionsupporting
confidence: 65%
“…Thus, according to, [56][57][58][59] the profiles of halogens (Cl, Br, and I) comprise four parts that can be treated as the sum of four complementary error functions. Assuming that a change in the diffusivity mechanism is accompanied with the CEF correlation between pre-factors D 0 and DE a, all the Arrhenius' parameters were used for the graphical analysis (Fig.…”
Section: Diffusion Of Halogens and Chalcogensmentioning
confidence: 99%