The contribution of fast neutrals to cathode erosion in glow discharges

Abril, Isabel; Gras‐Martí, A.; Vallés-Abarca, JA

doi:10.1088/0022-3727/17/9/009

Cited by 36 publications

(5 citation statements)

References 20 publications

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“…In contrast, in the continuum plasma case with high gas pressure, the practical electron and current characteristics of the spherical surface were examined by Patacchini and Hutchinson [38]. The heat transfer caused by the kinetic energy of electrons (Q ele ) and ions (Q ion ), including the energies of neutralized particles via charge exchange in the sheath region [39][40][41], can be calculated by considering the electron and ion currents at the droplet surface as follows:…”

Section: Evaporation Modelingmentioning

confidence: 99%

Evaporation behavior of liquid microdroplets in atmospheric-pressure nonequilibrium plasma

Nitta

Muneoka

Shimizu

et al. 2023

Plasma Sources Sci. Technol.

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In recent years, atmospheric-pressure nonequilibrium plasma processing using microdroplets has attracted significant attention. To improve the controllability of this process, an understanding of the evaporation behavior of droplets in plasma is highly desirable. In this study, we examine the evaporation behavior of well-controlled inkjet droplets in atmospheric-pressure nonequilibrium argon plasma through both experiments and modeling. A comparison of the droplet evaporation model based on energy balance considering gas temperature, electron and ion collisions, and recombination reactions with experimental evaporation behavior suggests that droplet evaporation is enhanced in high-density plasma environments with electron and ion densities exceeding 10^19 m^−3 when compared with that in non-ionized gaseous environments at a gas temperature below 1000 K.

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Section: Evaporation Modelingmentioning

confidence: 99%

Evaporation behavior of liquid microdroplets in atmospheric-pressure nonequilibrium plasma

Nitta

Muneoka

Shimizu

et al. 2023

Plasma Sources Sci. Technol.

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“…There has also been substantial interest in developing neutral beam etching (Economou (2008) and references therein). For low temperature plasma, few studies on the energy and angle distributions of fast neutrals are available in the literature (Abril et al (1984), Mason and Allott (1994), Börnig et al (1996), Bogaerts and Gijbels 1999), Ranjan et al (2006), Nam et al (2007), Derzsi et al (2015)) despite general acceptance of the importance of these species' surface bombardment. Abril et al (1984) was one of the earliest works studying the influence of fast neutrals on cathode sputtering.…”

Section: Introductionmentioning

confidence: 99%

“…For low temperature plasma, few studies on the energy and angle distributions of fast neutrals are available in the literature (Abril et al (1984), Mason and Allott (1994), Börnig et al (1996), Bogaerts and Gijbels 1999), Ranjan et al (2006), Nam et al (2007), Derzsi et al (2015)) despite general acceptance of the importance of these species' surface bombardment. Abril et al (1984) was one of the earliest works studying the influence of fast neutrals on cathode sputtering. They used a simple mathematical model to compute energy distributions of neutrals and ions and convoluted the distributions with sputtering yield functions to estimate etching yield due to the fast atoms.…”

Section: Introductionmentioning

confidence: 99%

Experimentally validated computations of simultaneous ion and fast neutral energy and angular distributions in a capacitively coupled plasma reactor

Upadhyay¹,

Suzuki²,

Raja³

et al. 2020

J. Phys. D: Appl. Phys.

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Accurate predictions of the ion energy and angular distribution functions (IEADFs) and fast neutral energy and angular distribution functions (FNEADFs), are essential for a range of critical applications in the plasma processing of thin film etching and deposition. Computationally efficient methods that can be applied to industrial reactor systems that are also validated across a range of operating conditions are essential for prediction of IEADFs and FNEADFs. In this work, we present a hybrid model where a capacitively coupled plasma (CCP) solution was computed using a fluid model and the IEADF/FNEADF was generated using a particle transport model with a multi-species Monte Carlo Collision model. We first compare the computed IEADFs across a range of pressures with experimental measurements for a CCP reactor. We predict FNEADFs that are typically difficult to measure experimentally but are believed to have a significant effect on etch/deposition process phenomena. Across a large pressure range, we observe significant fast neutral bombardment of the electrode surface with at least half the energy of the most energetic ions as well as an angular spread that is larger than that of the ions.

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“…The theoretical treatment of the transport equation, restricted to an expression for the distribution in one-dimensional velocity space, has been discussed in previous studies. [9][10][11][12][13][14] Monte Carlo simulation is performed to derive the distribution of the ions in two-dimensional velocity space. [15][16][17] A numerical approach based on the Boltzmann equation is also performed to investigate the twodimensional etching profile of dry etching.…”

Section: Introductionmentioning

confidence: 99%

Prediction of the evolution of the erosion profile in a direct current magnetron discharge

Okazawa

Shidoji

Makabe

1999

Journal of Applied Physics

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We have performed a simulation of ion and fast neutral transport in the sheath region of a direct current magnetron discharge under different pressures by using the Boltzmann equation and the database from the two-dimensional (2D) results of a plasma structure, which was given by a hybrid model. Evolution of the erosion profile on the target surface has been predicted by using the 2D energy distributions of ions and fast neutrals incident on the target (cathode) surface. We confirmed that an accurate prediction of the erosion profile can be obtained by assuming that the constant sputtering yield corresponds to the cathode voltage under conditions of low pressures that make use of the film deposition processes.

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The contribution of fast neutrals to cathode erosion in glow discharges

Cited by 36 publications

References 20 publications

Evaporation behavior of liquid microdroplets in atmospheric-pressure nonequilibrium plasma

Evaporation behavior of liquid microdroplets in atmospheric-pressure nonequilibrium plasma

Experimentally validated computations of simultaneous ion and fast neutral energy and angular distributions in a capacitively coupled plasma reactor

Prediction of the evolution of the erosion profile in a direct current magnetron discharge

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