Prediction of the evolution of the erosion profile in a direct current magnetron discharge

Okazawa, K.; Shidoji, Eiji; Makabe, Toshiaki

doi:10.1063/1.371158

Cited by 17 publications

(4 citation statements)

References 18 publications

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“…The sputtering yields [16,17] were obtained using TRIM assuming a surface binding energy at 10 eV [7]. TRIM provides the sputtering yield as a function of angle and energy of incident ions.…”

Section: Sputtering Yieldmentioning

confidence: 99%

MgO Erosion Profile in the High Pressure Coplanar Discharge

Lee

Yang

Seo

et al. 2007

Plasma Chem Plasma Process

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The sputtering of the MgO protective layer by energetic ions is one of the factors limiting the lifetime of the plasma display panels (PDPs). The sputtering profile of the MgO layer in a coplanar PDP cell has been studied using two-dimensional particle-incell Monte-Carlo Collision (PIC-MCC) simulations. The sputtering profile of the MgO layer for various gas conditions is obtained accounting for the energy and angle distributions of different ion species and their respective sputtering yields. Based on the simulation results, the MgO layer is more aggressively sputtered in Ne-based discharges than in He-based discharges. As a result, it is expected that the addition of He to the Ne-Xe mixture in PDPs will reduce the sputtering of the MgO layer and extend the lifetime of the PDP cells.

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Section: Sputtering Yieldmentioning

confidence: 99%

MgO Erosion Profile in the High Pressure Coplanar Discharge

Lee

Yang

Seo

et al. 2007

Plasma Chem Plasma Process

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“…The calculations are performed under the conditions of n p =n e = 0 on the metal surface, and of the charge accumulation { n p (r, z, t) -n e (r, z, t) }dt on the insulator. The hybrid model was validated in terms of the erosion profile derived from the magnetron plasma structure, in comparison with the experiment under the same dissipated power density [19].…”

Section: R Z T)]mentioning

confidence: 99%

A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling

Shidoji

Ando

Makabe

2001

Plasma Sources Sci. Technol.

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The influence of the differing magnetic field arrangements in both an unbalanced magnetron (UBM) and balanced magnetron (BM), both of which employ a dielectric substrate, on plasma characteristics has been numerically investigated under identical pressures and voltages. The UBM exhibits some interesting intrinsic characteristics with regard to the bulk plasma and the incident flux on the dielectric substrate. A property unique to the UBM is the appearance of negative plasma potential owing to the slightly excess amount of electrons when a magnetic field is arranged parallel to the axis of the bulk plasma in a cylindrical reactor and an electric field is arranged transversely to this axis. The dielectric substrate is negatively deep-biased, as compared with that in the BM, and is exposed to positive ion impact with a higher energy and flux, which will be controlled by changing the magnitude and direction of the external magnetic field.

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“…Therefore, as shown in Fig. 9(a), the incident-ion energy distribution has a peak at the energy that approximately corresponds to the sum of the cathode voltage and the plasma potential [17]. The sputtering yield has been commonly observed to linearly decrease as the ion energy is reduced from 1000 eV to 100 eV [18] and to decline drastically at a certain bending point.…”

Section: MMmentioning

confidence: 95%