A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling

Shidoji, Eiji; Ando, E.; Makabe, Toshiaki

doi:10.1088/0963-0252/10/4/311

Cited by 18 publications

(12 citation statements)

References 20 publications

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“…In the stationary on phase, a toroidal region of increased charge carrier density is clearly observable just above the target in the magnetic trap. Away from the target, the charge carrier density slowly decays with a pronounced radial gradient typical for unbalanced magnetrons 23,27,28. The distribution is indeed very similar to that in the dc case, showing that the stationary state is reached under these conditions.…”

Section: Resultsmentioning

confidence: 60%

Two-Dimensional Double Probe Study of the Temporal Evolution of the Charge Carrier Density in a Pulsed Magnetron

Welzel

Dunger

Richter

2007

Plasma Process. Polym.

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An asymmetric‐bipolar pulsed magnetron discharge was spatially studied in two dimensions with a time‐resolved Langmuir double probe. The cylindrical magnetron was equipped with an Mg target. The development of the charge carrier density during one pulse reveals the same characteristic as the two‐peak structure at the beginning of the ‘on’ phase which we have observed earlier. This temporal peak structure changes with position within the volume of the discharge between target and substrate. While the first maximum is dominant in the discharge centre with the plasma torus of the magnetron only weakly pronounced, the second peak is very intense in the torus region and comparably weak in the whole rest of the discharge. This peak distribution is explained by a simple model based on the acceleration of electrons left over from the previous pulse.

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Section: Resultsmentioning

confidence: 60%

Two-Dimensional Double Probe Study of the Temporal Evolution of the Charge Carrier Density in a Pulsed Magnetron

Welzel

Dunger

Richter

2007

Plasma Process. Polym.

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“…The theoretical analysis of electron transport in weakly ionized plasmas in the presence of electric and magnetic fields comes in three types: the hybrid model, particle-incell/Monte Carlo collision (PIC/MCC) and kinetic theory. Hybrid models treat fast electrons using MCC techniques and treat low-energy electrons using fluid models, which take advantage of the accuracy of MCC techniques and the computational efficiency of the fluid models [7,8]. The fluid parts of the hybrid models are based on Maxwellian electron energy distribution and have limitations; moreover, it is necessary to provide accurate electron transport and reaction coefficients.…”

Section: Introductionmentioning

confidence: 99%

Electron relaxation properties of Ar magnetron plasmas

Cai¹,

Wang²,

Zou³

2018

Plasma Sci. Technol.

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An understanding of electron relaxation properties in plasmas is of importance in the application of magnetrons. An improved multi-term approximation of the Boltzmann equation is employed to study electron transport and relaxation properties in plasmas. Elastic, inelastic and nonconservative collisions between electrons and neutral particles are considered. The expressions for the transport coefficients are obtained using the expansion coefficients and the collision operator term. Numerical solutions of the matrix equations for the expansion coefficients are also investigated. Benchmark calculations of the Reid model are presented to demonstrate the accuracy of the improved multi-term approximation. It is shown that the twoterm approximation is generally not accurate enough and the magnetic fields can reduce the anisotropy of the velocity distribution function. The electron relaxation properties of Ar plasmas in magnetrons for various magnetic fields are studied. It is demonstrated that the energy parameters change more slowly than the momentum parameters.

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“…On the other hand, it is much faster than the PIC/MCC approach, and therefore more suitable for large and complicated reactor geometries, such as dual-magnetron setups. Finally, a hybrid model [24], which combines different individual models, can be implemented to make use of the advantages and to avoid the limitations of the different models and also to achieve more reasonable computation times. However, such a hybrid model is usually based on the fluid approach, and therefore, it exhibits the same disadvantages as mentioned above for magnetron discharges.…”

Section: Introductionmentioning

confidence: 99%

Sputter deposition of Mg_xAl_yO_zthin films in a dual-magnetron device: a multi-species Monte Carlo model

et al. 2012

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A multi-species Monte Carlo (MC) model, combined with an analytical surface model, has been developed in order to investigate the general plasma processes occurring during the sputter deposition of complex oxide films in a dual-magnetron sputter deposition system. The important plasma species, such as electrons, Ar + ions, fast Ar atoms and sputtered metal atoms (i.e. Mg and Al atoms) are described with the so-called multi-species MC model, whereas the deposition of Mg x Al y O z films is treated by an analytical surface model. Target-substrate distances for both magnetrons in the dual-magnetron setup are varied for the purpose of growing stoichiometric complex oxide thin films. The metal atoms are sputtered from pure metallic targets, whereas the oxygen flux is only directed toward the substrate and is high enough to obtain fully oxidized thin films but low enough to avoid target poisoning. The calculations correspond to typical experimental conditions applied to grow these complex oxide films. In this paper, some calculation results are shown, such as the densities of various plasma species, their fluxes toward the targets and substrate, the deposition rates, as well as the film stoichiometry. Moreover, some results of the combined model are compared with experimental observations. Note that this is the first complete model, which can be applied for large and complicated magnetron reactor geometries, such as dual-magnetron configurations. With this model,

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A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling

Cited by 18 publications

References 20 publications

Two-Dimensional Double Probe Study of the Temporal Evolution of the Charge Carrier Density in a Pulsed Magnetron

Two-Dimensional Double Probe Study of the Temporal Evolution of the Charge Carrier Density in a Pulsed Magnetron

Electron relaxation properties of Ar magnetron plasmas

Sputter deposition of Mg_xAl_yO_zthin films in a dual-magnetron device: a multi-species Monte Carlo model

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A comparative study of an unbalanced magnetron with dielectric substrate with a conventional magnetron through the use of hybrid modelling

Cited by 18 publications

References 20 publications

Two-Dimensional Double Probe Study of the Temporal Evolution of the Charge Carrier Density in a Pulsed Magnetron

Two-Dimensional Double Probe Study of the Temporal Evolution of the Charge Carrier Density in a Pulsed Magnetron

Electron relaxation properties of Ar magnetron plasmas

Sputter deposition of MgxAlyOzthin films in a dual-magnetron device: a multi-species Monte Carlo model

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Sputter deposition of Mg_xAl_yO_zthin films in a dual-magnetron device: a multi-species Monte Carlo model