Thin ZnO:Al layers were deposited by pulsed laser deposition (PLD) in vacuum and in oxygen atmosphere at gas pressures between 10 and 70 Pa and by applying RF plasma.Grazing incidence small angle x-ray scattering (GISAXS) and grazing incidence x-ray diffraction (GIXRD) data showed that an increase of the oxygen pressure leads to an increase of the roughness, a decrease of the sample density and to changes in the size distribution of nano-voids. The nano-crystals sizes estimated from GIXRD were around 20 nm, while the sizes of the nano-voids increased from 1 to 2 nm with the oxygen pressure. The RF plasma mainly influenced the nano-structural properties and point defects dynamics. The photoluminescence consisted of 3 contributions: UV, blue emission due to Zn vacancies, and red emission which is related to an excess of oxygen.The RF excitation lowered the defect level related to blue emission and narrowed the UV luminescence peak, which indicates an improvement of the structural ordering. The 2 observed influence of the deposition conditions on the film properties is discussed as a consequence of two main effects: the variation of the energy transfer from the laser plume to the growing film, and changes in the growth chemistry.