2003
DOI: 10.1143/jjap.42.2824
|View full text |Cite
|
Sign up to set email alerts
|

Tetrahedral Amorphous Carbon Films By Filtered Cathodic Vacuum-Arc Deposition For Air-Bearing-Surface Overcoat

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
6
0

Year Published

2006
2006
2021
2021

Publication Types

Select...
6
3

Relationship

2
7

Authors

Journals

citations
Cited by 18 publications
(9 citation statements)
references
References 2 publications
0
6
0
Order By: Relevance
“…One shortcoming of deposition by arc discharge is that it generates numerous particulates several microns in size. FCVA was developed to prevent generated particulates from reaching the substrate [7,8]. In the present study, an FCVA system made by Nanofilm Technology Institute (NTI) was used.…”
Section: Methodsmentioning
confidence: 99%
“…One shortcoming of deposition by arc discharge is that it generates numerous particulates several microns in size. FCVA was developed to prevent generated particulates from reaching the substrate [7,8]. In the present study, an FCVA system made by Nanofilm Technology Institute (NTI) was used.…”
Section: Methodsmentioning
confidence: 99%
“…1) Many methods have been develped to improve the basic properties of titanium devices. 2,3) Diamond-like carbon (DLC) is a well-known coating material for a wide range of fields from wrist watches to car motors [4][5][6][7] owing to its high durability, high hardness, and low friction. DLC has been widely studied from many aspects such as hydrogen content, bond components, and mass density.…”
Section: Introductionmentioning
confidence: 99%
“…The general growth rates of these films deposited by plasma-enhanced CVD are reported in the range of 0.5-5 μm/h [2,3], and CVD amorphous carbon films have been widely used in industry mainly to provide wear resistant and lubricative properties with the sliding surfaces such as recording media, tools and mechanical parts. On the other hand, physical vapor deposition (PVD) techniques, such as filtered cathodic vacuum arc deposition [4], mass separated ion beam deposition [5], laser assisted deposition [6] and sputtering, are the most preferable methods for developing unhydrogenated amorphous carbon films. The unhydrogenated amorphous carbon films can be harder than CVD films and also commercially used as a coating for magnetic head sliders and cutting tools.…”
Section: Introductionmentioning
confidence: 99%