2011
DOI: 10.1016/j.diamond.2011.06.002
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Deposition of amorphous carbon films from C60 fullerene sublimated in electron beam excited plasma

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Cited by 7 publications
(2 citation statements)
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“…10,11) A graphite plate (Tokai Carbon G530) with a diameter of 100 mm was used as the target. The target power was adjusted to be 300 W. The negative bias applied to the substrate during substrate sputtering was measured by a Vdc/Vpp meter (JEOL EH-RBS10) 12,13) and controlled by rf power to the substrate. 14) Al alloy (JIS AA2017, 3.5-4.5% Cu) disks ( ¼ 24 mm, t ¼ 6 mm) were used as substrates.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…10,11) A graphite plate (Tokai Carbon G530) with a diameter of 100 mm was used as the target. The target power was adjusted to be 300 W. The negative bias applied to the substrate during substrate sputtering was measured by a Vdc/Vpp meter (JEOL EH-RBS10) 12,13) and controlled by rf power to the substrate. 14) Al alloy (JIS AA2017, 3.5-4.5% Cu) disks ( ¼ 24 mm, t ¼ 6 mm) were used as substrates.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…To avoid damage caused by removing the transferring layer and organic contaminant introduced in this step, we used fullerene as a support layer instead. Due to the different heat stability of fullerene and graphene, fullerene could be evaporated and removed while graphene keeps intact under the appropriate temperature [22][23][24]. Apart from the key improvement detailed above, the general technical route of our method is similar to the traditional PMMA transfer method.…”
mentioning
confidence: 99%