2012
DOI: 10.1109/mdt.2012.2205609
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Testing of Stuck-Open Faults in Nanometer Technologies

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Cited by 10 publications
(9 citation statements)
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“…According to the work in [18], some recommendations can be followed when configuring the faulty gate and the corresponding downstream gates to minimize the influence of leakage currents. In the above example, three combinations for inputs (B C) can be used to propagate the fault.…”
Section: Test Recommendationsmentioning
confidence: 99%
See 1 more Smart Citation
“…According to the work in [18], some recommendations can be followed when configuring the faulty gate and the corresponding downstream gates to minimize the influence of leakage currents. In the above example, three combinations for inputs (B C) can be used to propagate the fault.…”
Section: Test Recommendationsmentioning
confidence: 99%
“…In fact, new paradigms have arisen which appeal for the revision of the classical model to extend the detectability of these faults in nanometer technologies. In this direction, the works in [17] and [18] demonstrate the influence of leakage on the behavior of the faulty cells affected by the SOFs. Downstream parasitic capacitances related to the faulty node, which were considered a second-order factor in past technologies, also arise as a nonnegligible factor.…”
Section: Introductionmentioning
confidence: 97%
“…The results manifested that when the number of faults is large enough, the defect can be captured by SOF or delay fault tests. Champac et al [13] presented the problem of SOF detection for small nanometer technologies. They proposed a new multiple test vector mechanism to enhance the probability of SOF detection.…”
Section: Background and Motivationmentioning
confidence: 99%
“…For instance, stuck-at [11], delay [12], stuck-Open [13], and bridging fault [14] are among the most commonly-used models for CMOS technology. For FinFETs, a few number of studies have been conducted in modeling defects such as floating gates and shorts [15], [16], stuck-Open/stuckOn [17], [18], and gate oxide short (GOS) [19].…”
Section: Introductionmentioning
confidence: 99%
“…For instance, stuck-at [8], delay [9], stuck-open [10], and bridging fault [11] are among the most commonly-used models for CMOS technology. For FinFETs, a few number of studies have been conducted in modeling defects such as floating gates and shorts [12,13], stuck-open/stuck-on [14,15], and Gate Oxide Short (GOS) [16].…”
Section: Introductionmentioning
confidence: 99%