IEEE Ultrasonics Symposium, 2005.
DOI: 10.1109/ultsym.2005.1602917
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Temperature compensated LiTaO/sub 3//sapphire saw substrate for high power applications

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Cited by 48 publications
(46 citation statements)
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“…When a stiff material with small CTE is chosen as the base substrate, the bonding suppresses the thermal expansion of the top surface where SAW propagates. Various bonding technologies such as fusion [20][21][22]28], room temperature [25][26][27][28] and adhesive [23,30,31] ones, have been investigated. Although the adhesive one seems most cost-effective, it is not clear whether the adhesive is stable during and after the device fabrication.…”
Section: B Wafer Bondingmentioning
confidence: 99%
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“…When a stiff material with small CTE is chosen as the base substrate, the bonding suppresses the thermal expansion of the top surface where SAW propagates. Various bonding technologies such as fusion [20][21][22]28], room temperature [25][26][27][28] and adhesive [23,30,31] ones, have been investigated. Although the adhesive one seems most cost-effective, it is not clear whether the adhesive is stable during and after the device fabrication.…”
Section: B Wafer Bondingmentioning
confidence: 99%
“…As the base-substrate, Si [21][22][23]28,30,31], glass (fused quartz) [21][22][23][24][29][30][31], and sapphire [25][26][27] have been tested. Sapphire is most appropriate for the TCF improvement, but expensive.…”
Section: B Wafer Bondingmentioning
confidence: 99%
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“…So, small TCF is also required in addition to moderate K 2 more than 7% to realize SAW duplexers for these systems. Recently, several device configurations have been examined and reported for the application; a conventional SiO 2 /Al/LiTaO 3 structure [1], a [6], and a wafer-bonded LiTaO 3 /sapphire substrate [7]. Moreover, the authors reported that the SAW resonator with a moderate K 2 , a zero TCF, and no Rayleigh-mode spurious response could be realized by optimizing the SiO 2 shape above the IDT and the SiO 2 thickness on a SiO 2 /Al/LiNbO 3 structure [8].…”
Section: Introductionmentioning
confidence: 99%